SCHEMBL15045360

SCHEMBL15045360

CCC(C)(C)C(=O)NC(=O)c1ccco1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.50
KMT2A Q03164 3/20 0.50
RIPK1 Q13546 1/20 0.50
RAB9A P51151 6/20 0.49
NPC1 O15118 5/20 0.49
GAA P10253 3/20 0.49
TP53 P04637 3/20 0.49
HDAC3 O15379 1/20 0.49
ALDH1A1 P00352 4/20 0.49
SMN1; SMN2 Q16637 4/20 0.47
PKM P14618 1/20 0.47
MAPT P10636 4/20 0.47
LMNA P02545 2/20 0.47
MAPK1 P28482 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
ALOX12 P18054 1/20 0.47
NFKB1 P19838 1/20 0.47
NFKB2 Q00653 1/20 0.47
RELA Q04206 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27534126 0.82 MEN1 (0.54) MEN1KMT2ARAB9ANPC1GAA
SCHEMBL20169790 0.78 RIPK1 (0.50) MEN1KMT2ARIPK1RAB9ANPC1
SCHEMBL23801091 0.78 MEN1 (0.60) MEN1KMT2ARAB9ANPC1GAA
SCHEMBL8702006 0.77 CES2 (0.62) MEN1KMT2ARAB9ANPC1GAA
SCHEMBL27339507 0.74 SMN1; SMN2 (0.64) RAB9ANPC1GAATP53ALDH1A1
SCHEMBL28793821 0.74 RAB9A (0.62) MEN1KMT2ARAB9ANPC1GAA
SCHEMBL14946430 0.74 GLA (0.54) MEN1KMT2ARAB9ANPC1GAA
SCHEMBL5788908 0.73 RIPK1 (0.56) MEN1KMT2ARIPK1RAB9ANPC1
SCHEMBL11683297 0.73 ALDH1A1 (0.68) MEN1KMT2ARAB9ANPC1GAA
SCHEMBL581489 0.73 MEN1 (0.68) MEN1KMT2ARAB9ANPC1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8778595-B2 Resist composition, method of forming resist pattern, and polymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2014-07-15 US disclosed
US-20130157201-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2013-06-20 US disclosed