Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.37 |
| ▸ | POLB | P06746 | 2/20 | 0.37 |
| ▸ | APEX1 | P27695 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | PPARA | Q07869 | 2/20 | 0.36 |
| ▸ | GLA | P06280 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | AKR1B10 | O60218 | 1/20 | 0.35 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | EGFR | P00533 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 3/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.34 |
| ▸ | RAB9A | P51151 | 2/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7205677 | 0.83 | TDP1 (0.41) | TDP1POLBAPEX1HTTGLA | |
| Cinnamic Acid SCHEMBL28185054 | 0.82 | HDAC3 (0.53) | TDP1POLBAPEX1HTTGLA | |
| Styrene SCHEMBL409075 | 0.80 | TDP1 (0.43) | TDP1POLBAPEX1HTTGLA | |
| Styrene SCHEMBL9305623 | 0.80 | TDP1 (0.43) | TDP1POLBAPEX1HTTGLA | |
| SCHEMBL5843377 | 0.80 | TDP1 (0.44) | TDP1POLBAPEX1HTTGLA | |
| SCHEMBL3007714 | 0.79 | THRB (0.42) | TDP1POLBAPEX1HTTGLA | |
| SCHEMBL4968472 | 0.79 | PPARG (0.39) | TDP1POLBAPEX1HTTGLA | |
| SCHEMBL9305618 | 0.79 | PAM (0.45) | TDP1POLBAPEX1HTTGLA | |
| SCHEMBL8171290 | 0.79 | POLB (0.40) | TDP1POLBAPEX1HTTGLA | |
| Styrene SCHEMBL11239895 | 0.78 | TDP1 (0.41) | TDP1POLBAPEX1HTTGLA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8158326-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-04-17 | — | — | US | disclosed |
| US-7914965-B2 | Resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2011-03-29 | — | — | US | disclosed |
| US-20090075202-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND METHOD OF PATTERN FORMATION WITH THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-7449573-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-11-11 | — | — | US | disclosed |
| EP-1662317-A2 | Resist composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-05-31 | — | — | EP | disclosed |
| US-20060068320-A1 | Resist composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2006-03-30 | — | — | US | disclosed |
| US-20060040203-A1 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2006-02-23 | — | — | US | disclosed |
| US-6902862-B2 | Resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-06-07 | — | — | US | disclosed |
| US-20040058272-A1 | Resist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-25 | — | — | US | disclosed |