Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.36 |
| ▸ | KCNA1 | Q09470 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrylammonium SCHEMBL27869204 | 0.85 | TSHR (0.44) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Tetrapropylammonium SCHEMBL6620844 | 0.85 | SLC22A1 (0.40) | TSHR | |
| SCHEMBL6617792 | 0.84 | DNM1 (0.52) | TSHR | |
| Tetramethylammonium Ion SCHEMBL1507263 | 0.83 | — | — | |
| Tetrylammonium SCHEMBL22494153 | 0.83 | TSHR (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Tetrabuthylammonium SCHEMBL991018 | 0.82 | SLC22A1 (0.44) | TSHR | |
| SCHEMBL6616480 | 0.81 | SLC22A1 (0.46) | TSHR | |
| Tetrahexylammonium SCHEMBL7662219 | 0.81 | SLC22A1 (0.46) | TSHR | |
| SCHEMBL6619376 | 0.80 | CYP1A2 (0.41) | TSHRKDM4E | |
| SCHEMBL6620949 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8026200-B2 | Low pH mixtures for the removal of high density implanted resist | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-09-27 | — | — | US | claimed |
| US-8026200-B2 | Low pH mixtures for the removal of high density implanted resist | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-09-27 | — | — | US | disclosed |
| EP-2288965-A2 | LOW PH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | Advanced Technology Materials, Inc. (US) | 2011-03-02 | — | — | EP | disclosed |
| US-20090281016-A1 | LOW pH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-11-12 | — | — | US | disclosed |
| WO-2009135102-A2 | LOW PH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-11-05 | — | — | WO | disclosed |
| EP-0985664-B1 | Method of producing pyrrolidine derivatives | TORAY FINECHEMICALS CO LTD (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6479668-B1 | Method of producing pyrrolidine derivatives | TORAY INDUSTRIES, INC. (JP) | 2002-11-12 | — | — | US | disclosed |
| US-6130338-A | OXIDATING THE CORRESPONDING 3-PYRROLINE COMPOUND TO GIVE AN EPOXYPYRROLIDINE COMPOUND | TORAY INDUSTRIES, INC. (JP) | 2000-10-10 | — | — | US | disclosed |
| EP-0985664-A2 | Method of producing pyrrolidine derivatives | TORAY INDUSTRIES, INC. (JP) | 2000-03-15 | — | — | EP | disclosed |