SCHEMBL15082083

SCHEMBL15082083

O=C(O)CCc1ccccc1SN(C1CCCCC1)C1CCCCC1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ THRA P10827 1/20 0.43
▸ THRB P10828 1/20 0.43
▸ L3MBTL1 Q9Y468 1/20 0.42
▸ ALDH1A1 P00352 3/20 0.41
▸ CYSLTR2 Q9NS75 1/20 0.39
▸ CYSLTR1 Q9Y271 1/20 0.39
▸ MEN1 O00255 2/20 0.39
▸ KMT2A Q03164 2/20 0.39
▸ KDM4E B2RXH2 1/20 0.39
▸ NPC1 O15118 1/20 0.39
▸ MITF O75030 1/20 0.39
▸ RAB9A P51151 1/20 0.39
▸ PAX8 Q06710 1/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ LMNA P02545 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ FFAR4 Q5NUL3 5/20 0.37
▸ FFAR1 O14842 3/20 0.37
▸ PTGER1 P34995 1/20 0.37
▸ PTGER4 P35408 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7346532 0.72 EPHX2 (0.40) THRATHRBALDH1A1CYSLTR2CYSLTR1
SCHEMBL11919540 0.71 PTGDR2 (0.54) THRATHRBCYSLTR2CYSLTR1FFAR4
SCHEMBL2162246 0.70 KEAP1 (0.48) L3MBTL1ALDH1A1KMT2ASMN1; SMN2LMNA
SCHEMBL27744713 0.70 KEAP1 (0.48) SMN1; SMN2NPSR1FFAR4FFAR1PTGER1
SCHEMBL59198 0.68 KEAP1 (0.65) SMN1; SMN2NPSR1FFAR4FFAR1PTGER1
SCHEMBL7346534 0.68 POLB (0.38) L3MBTL1ALDH1A1MEN1KMT2AKDM4E
SCHEMBL3110101 0.67 CA12 (0.51) ALDH1A1SMN1; SMN2NPSR1FFAR4FFAR1
SCHEMBL6565764 0.67 ALDH1A1 (0.41) L3MBTL1ALDH1A1MEN1KMT2AKDM4E
SCHEMBL19149099 0.67 ALDH1A1 (0.41) L3MBTL1ALDH1A1MEN1KMT2AKDM4E
SCHEMBL3405256 0.66 THRA (0.56) THRATHRBNPSR1FFAR4PTGER1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9188862-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same FUJIFILM CORPORATION (JP) 2015-11-17 — — US disclosed
US-9188862-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same FUJIFILM CORPORATION (JP) 2015-11-17 — — US disclosed
US-20140295332-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2014-10-02 — — US disclosed
US-20140295332-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2014-10-02 — — US disclosed
WO-2013100158-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2013-07-04 — — WO disclosed
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