Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.32 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.32 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.32 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.32 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.32 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14307495 | 0.80 | CYP2D6 (0.32) | CYP2D6DGAT1HDAC3HDAC1HDAC2 | |
| SCHEMBL16139487 | 0.80 | CYP2D6 (0.32) | CYP2D6DGAT1HDAC3HDAC1HDAC2 | |
| Bromide SCHEMBL11395572 | 0.79 | DGAT1 (0.33) | CYP2D6DGAT1HDAC3HDAC1HDAC2 | |
| SCHEMBL16141690 | 0.78 | CA12 (0.33) | CYP2D6DGAT1HDAC3HDAC1HDAC2 | |
| SCHEMBL12040169 | 0.78 | DGAT1 (0.34) | CYP2D6DGAT1HDAC3HDAC1HDAC2 | |
| SCHEMBL2930861 | 0.73 | — | — | |
| SCHEMBL20694270 | 0.71 | NR1D1 (0.32) | — | |
| SCHEMBL14089793 | 0.70 | DGAT1 (0.37) | DGAT1CA12CA2CA14 | |
| SCHEMBL20892278 | 0.70 | MTNR1A (0.37) | CA12CA14 | |
| SCHEMBL644646 | 0.69 | TSHR (0.45) | CYP2D6DGAT1HDAC3HDAC1HDAC2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013100158-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-07-04 | — | — | WO | disclosed |