SCHEMBL15097610

SCHEMBL15097610

COSc1ccc(C(C)C)c(F)c1

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PDE2A O00408 2/20 0.33
APLNR P35414 2/20 0.32
NAAA Q02083 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15108319 0.79 AKR1C3 (0.36) PDE2A
SCHEMBL15097617 0.78 GABRA1 (0.31)
SCHEMBL15097478 0.77 NOTUM (0.39)
SCHEMBL24685170 0.76 SMN1; SMN2 (0.36) PDE2A
SCHEMBL15097607 0.75
SCHEMBL26033274 0.74 KDM4E (0.39) PDE2A
SCHEMBL15097612 0.74 AR (0.43)
SCHEMBL15097480 0.74 TYR (0.34)
SCHEMBL18737240 0.73 SLC6A4 (0.42)
SCHEMBL15097615 0.71 PDK1 (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130177851-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-11 US disclosed