SCHEMBL15216280

SCHEMBL15216280

O=C(OCC(F)(F)S(=O)(=O)O)c1cc[nH]c1

nearest known ligand 0.36

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.36
HIF1A Q16665 1/20 0.36
SIRT2 Q8IXJ6 1/20 0.34
EPHX2 P34913 1/20 0.32
JMJD6 Q6NYC1 1/20 0.32
GSK3A P49840 2/20 0.30
RPS6KA3 P51812 2/20 0.30
MAPK14 Q16539 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21292572 0.79 MAPK1 (0.38) MAPK1HIF1ASIRT2EPHX2JMJD6
SCHEMBL7600616 0.78 MAPK1 (0.61) MAPK1HIF1A
SCHEMBL12473951 0.77 MAPK1 (0.46) MAPK1HIF1A
SCHEMBL18786045 0.77 ADRB2 (0.44) MAPK1HIF1A
SCHEMBL18785337 0.77 ESR1 (0.50) MAPK1HIF1A
SCHEMBL18785929 0.76 GAA (0.43) MAPK1HIF1A
SCHEMBL15216328 0.76 LMNA (0.51) MAPK1HIF1A
SCHEMBL18786029 0.76 GAA (0.49) MAPK1HIF1A
SCHEMBL18785616 0.76 HPGD (0.45) MAPK1HIF1A
SCHEMBL9944399 0.76 L3MBTL1 (0.45) MAPK1HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11579529-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-02-14 US disclosed
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-10 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS POLR1C, EWSR1, LBR MAPK1 967/4885HIF1A 3722/4885SIRT2 4535/4885
US-11579529-B2 Positive resist composition and patterning process POLR1C, EWSR1, LBR MAPK1 967/4885HIF1A 3722/4885SIRT2 4535/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.