Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | JMJD6 | Q6NYC1 | 1/20 | 0.32 |
| ▸ | GSK3A | P49840 | 2/20 | 0.30 |
| ▸ | RPS6KA3 | P51812 | 2/20 | 0.30 |
| ▸ | MAPK14 | Q16539 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21292572 | 0.79 | MAPK1 (0.38) | MAPK1HIF1ASIRT2EPHX2JMJD6 | |
| SCHEMBL7600616 | 0.78 | MAPK1 (0.61) | MAPK1HIF1A | |
| SCHEMBL12473951 | 0.77 | MAPK1 (0.46) | MAPK1HIF1A | |
| SCHEMBL18786045 | 0.77 | ADRB2 (0.44) | MAPK1HIF1A | |
| SCHEMBL18785337 | 0.77 | ESR1 (0.50) | MAPK1HIF1A | |
| SCHEMBL18785929 | 0.76 | GAA (0.43) | MAPK1HIF1A | |
| SCHEMBL15216328 | 0.76 | LMNA (0.51) | MAPK1HIF1A | |
| SCHEMBL18786029 | 0.76 | GAA (0.49) | MAPK1HIF1A | |
| SCHEMBL18785616 | 0.76 | HPGD (0.45) | MAPK1HIF1A | |
| SCHEMBL9944399 | 0.76 | L3MBTL1 (0.45) | MAPK1HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11579529-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-14 | — | — | US | disclosed |
| US-20200285152-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-09-10 | — | — | US | disclosed |
| US-8900796-B2 | Acid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-8900796-B2 | Acid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-20130224657-A1 | ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224657-A1 | ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200285152-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | POLR1C, EWSR1, LBR | MAPK1 967/4885HIF1A 3722/4885SIRT2 4535/4885 |
| US-11579529-B2 | Positive resist composition and patterning process | POLR1C, EWSR1, LBR | MAPK1 967/4885HIF1A 3722/4885SIRT2 4535/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.