SCHEMBL15219217

SCHEMBL15219217

CCOCCOc1cccc(OCCOCC)c1

nearest known ligand 0.60

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.57
HTT P42858 1/20 0.57
TSHR P16473 3/20 0.53
LMNA P02545 2/20 0.53
MAPT P10636 2/20 0.53
NCF1 P14598 2/20 0.51
MEN1 O00255 2/20 0.51
KMT2A Q03164 2/20 0.51
TAAR1 Q96RJ0 1/20 0.51
MAPK1 P28482 5/20 0.50
L3MBTL1 Q9Y468 2/20 0.50
CYP1A2 P05177 1/20 0.50
CYP2D6 P10635 1/20 0.50
CYP2C19 P33261 1/20 0.50
TDP1 Q9NUW8 1/20 0.48
TP53 P04637 1/20 0.48
CYP3A4 P08684 1/20 0.48
ALDH1A1 P00352 3/20 0.48
RECQL P46063 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16669059 0.98 KDM4E (0.59) KDM4EHTTTSHRLMNAMAPT
SCHEMBL16667635 0.98 KDM4E (0.59) KDM4EHTTTSHRLMNAMAPT
SCHEMBL5038332 0.92 MAPK1 (0.62) KDM4EHTTTSHRLMNAMAPT
SCHEMBL7922018 0.89 KDM4E (0.49) KDM4EHTTTSHRLMNAMAPT
SCHEMBL7387403 0.88 L3MBTL1 (0.59) KDM4EHTTLMNAMAPTMEN1
SCHEMBL14559903 0.88 LMNA (0.48) KDM4EHTTTSHRLMNAMAPT
SCHEMBL2211592 0.87 CHRNB2 (0.60) KDM4EHTTLMNAMAPTNCF1
SCHEMBL7387402 0.87 KDM4E (0.47) KDM4EHTTTSHRLMNAMAPT
SCHEMBL6302587 0.87 CYP3A4 (0.70) KDM4EHTTTSHRLMNAMAPT
SCHEMBL7931071 0.87 MAOB (0.54) KDM4EHTTLMNAMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2813890-A2 Photoresist underlayer film-forming composition and pattern forming process Shin-Etsu Chemical Co., Ltd. (JP) 2014-12-17 EP disclosed
EP-2813892-A2 Photoresist underlayer film-forming composition and pattern forming process Shin-Etsu Chemical Co., Ltd. (JP) 2014-12-17 EP disclosed
EP-2813891-A2 Photoresist underlayer film-forming composition and pattern forming process Shin-Etsu Chemical Co., Ltd. (JP) 2014-12-17 EP disclosed
EP-2813889-A2 Photoresist underlayer film-forming composition and pattern forming process Shin-Etsu Chemical Co., Ltd. (JP) 2014-12-17 EP disclosed
EP-2463714-B1 Basic compound, chemically amplified resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-28 EP disclosed