SCHEMBL15301281

SCHEMBL15301281

CC(C)c1ccc(C2=NN(c3ccccc3)C(c3ccccc3)C2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 7/20 0.60
▸ KMT2A Q03164 7/20 0.60
▸ ATM Q13315 4/20 0.60
▸ EGFR P00533 7/20 0.58
▸ ERBB2 P04626 7/20 0.58
▸ ERBB3 P21860 2/20 0.58
▸ KDR P35968 2/20 0.58
▸ PTK2 Q05397 2/20 0.58
▸ GAA P10253 3/20 0.57
▸ HSP90AA1 P07900 1/20 0.57
▸ L3MBTL1 Q9Y468 2/20 0.56
▸ MAOA P21397 1/20 0.56
▸ MAOB P27338 1/20 0.56
▸ CA1 P00915 3/20 0.55
▸ CA2 P00918 3/20 0.55
▸ PTGS2 P35354 1/20 0.55
▸ KDM4E B2RXH2 2/20 0.54
▸ ALDH1A1 P00352 2/20 0.54
▸ GLA P06280 2/20 0.54
▸ HTT P42858 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15301033 0.97 EGFR (0.62) MEN1KMT2AATMEGFRERBB2
SCHEMBL15301362 0.97 MEN1 (0.60) MEN1KMT2AATMEGFRERBB2
SCHEMBL15300830 0.94 EGFR (0.65) MEN1KMT2AATMEGFRERBB2
SCHEMBL15301210 0.94 MEN1 (0.64) MEN1KMT2AATMEGFRERBB2
SCHEMBL15301173 0.92 PRKCZ (0.64) MEN1KMT2AATMEGFRERBB2
SCHEMBL23052047 0.91 EGFR (0.69) MEN1KMT2AATMEGFRERBB2
SCHEMBL23052315 0.91 EGFR (0.69) MEN1KMT2AATMEGFRERBB2
SCHEMBL18040117 0.90 PRKCZ (0.62) MEN1KMT2AEGFRERBB2ERBB3
SCHEMBL15377485 0.89 EGFR (0.73) MEN1KMT2AATMEGFRERBB2
SCHEMBL2689592 0.89 EGFR (0.54) MEN1KMT2AATMEGFRERBB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026100065-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD 株式会社レゾナック 2026-05-15 — — WO disclosed
US-20240059803-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-02-22 — — US disclosed
CN-111527450-B Photosensitive resin laminate and method for producing same 旭化成株式会社 2023-08-08 — — CN disclosed
WO-2022186389-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME 旭化成株式会社 2022-09-09 — — WO disclosed
CN-108375874-B Photosensitive resin composition, photosensitive resin laminate, substrate having resist pattern formed thereon, and method for producing circuit board 旭化成株式会社 2021-10-22 — — CN disclosed
CN-111527450-A Photosensitive resin laminate and method for producing same 旭化成株式会社 2020-08-11 — — CN disclosed
CN-104781730-B Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board 日立化成株式会社 2020-03-06 — — CN disclosed
CN-108375874-A The manufacturing method of photosensitive polymer combination, photoresist laminated body, the substrate for being formed with corrosion-resisting pattern and circuit board 旭化成株式会社 2018-08-07 — — CN disclosed
CN-107422606-A The manufacture method of photosensitive element, the forming method of corrosion-resisting pattern and printed wiring board 日立化成株式会社 2017-12-01 — — CN disclosed
CN-107367903-A The manufacture method of photosensitive element, the forming method of corrosion-resisting pattern and printed wiring board 日立化成株式会社 2017-11-21 — — CN disclosed
US-9439291-B2 Photosensitive element, method for forming resist pattern, and method for producing printed circuit board HITACHI CHEMICAL COMPANY, LTD. (JP) 2016-09-06 — — US disclosed
US-20150293443-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD HITACHI CHEMICAL COMPANY, LTD. (JP) 2015-10-15 — — US disclosed
CN-104781730-A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board HITACHI CHEMICAL CO LTD 2015-07-15 — — CN disclosed
US-20130298398-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD HITACHI CHEMICAL COMPANY, LTD. (JP) 2013-11-14 — — US disclosed
US-20130266900-A1 PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED CIRCUIT BOARD HITACHI CHEMICAL COMPANY, LTD. (JP) 2013-10-10 — — US disclosed
CN-103339568-A Photosensitive resin composition, photosensitive element, method for producing resist pattern, and method for manufacturing printed wiring board HITACHI CHEMICAL CO LTD 2013-10-02 — — CN disclosed
CN-103261966-A Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board HITACHI CHEMICAL CO LTD 2013-08-21 — — CN disclosed
CN-103221887-A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board HITACHI CHEMICAL CO LTD 2013-07-24 — — CN disclosed
CN-103091985-A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board HITACHI CHEMICAL CO LTD 2013-05-08 — — CN disclosed
CN-103076717-A Photosensitive resin composition, photosensitive component, forming method of corrosion-resistant pattern and manufacturing method of printed wiring board HITACHI CHEMICAL CO LTD 2013-05-01 — — CN disclosed
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