SCHEMBL1532860

SCHEMBL1532860

CCCCCC(CCC)O[SiH3]

nearest known ligand 0.39

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.39
LMNA P02545 1/20 0.36
DNM1 Q05193 2/20 0.35
FDPS P14324 4/20 0.33
SMPD1 P17405 3/20 0.33
TSHR P16473 1/20 0.33
THRB P10828 1/20 0.33
ZDHHC7 Q9NXF8 1/20 0.32
GPR84 Q9NQS5 2/20 0.32
SPHK1 Q9NYA1 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2772318 0.98 LMNA (0.39) OPRM1LMNADNM1FDPSSMPD1
SCHEMBL9009721 0.98 LMNA (0.39) OPRM1LMNADNM1FDPSSMPD1
SCHEMBL4770413 0.95 OPRM1 (0.42) OPRM1LMNADNM1FDPSSMPD1
SCHEMBL4766710 0.92 LMNA (0.42) OPRM1LMNADNM1FDPSSMPD1
SCHEMBL6057209 0.92 LMNA (0.42) OPRM1LMNADNM1FDPSSMPD1
SCHEMBL3796584 0.92 LMNA (0.42) OPRM1LMNADNM1FDPSSMPD1
SCHEMBL11207866 0.92 LMNA (0.42) OPRM1LMNADNM1FDPSSMPD1
SCHEMBL7056921 0.92 LMNA (0.42) OPRM1LMNADNM1FDPSSMPD1
SCHEMBL3482199 0.92 DNM1 (0.42) OPRM1LMNADNM1FDPSSMPD1
SCHEMBL705781 0.92 DNM1 (0.36) LMNADNM1FDPSTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4056604-B1 METHOD FOR PRODUCING COPOLYMER OF 1,3,7-OCTATRIENE AND STYRENE KURARAY CO (JP) 2023-08-02 EP disclosed
EP-3564280-B1 COPOLYMER OF 1, 3, 7-OCTATRIENE AND STYRENE AND HYDRIDE THEREOF KURARAY CO (JP) 2023-07-26 EP disclosed
EP-4163311-A1 COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER Kuraray Co., Ltd. (JP) 2023-04-12 EP disclosed
EP-4163312-A1 COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER Kuraray Co., Ltd. (JP) 2023-04-12 EP disclosed
EP-3564274-B1 1, 3, 7-OCTATRIENE POLYMER, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID POLYMER KURARAY CO (JP) 2022-12-28 EP disclosed
EP-4056604-A1 METHOD FOR PRODUCING COPOLYMER OF 1,3,7-OCTATRIENE AND STYRENE Kuraray Co., Ltd. (JP) 2022-09-14 EP disclosed
US-11332567-B2 Copolymer of 1, 3, 7-octatriene and butadiene, hydride thereof, and method for producing said copolymer KURARAY CO., LTD. (JP) 2022-05-17 US disclosed
US-11198744-B2 1,3, 7-octatriene polymer, hydride thereof, and method for producing said polymer KURARAY CO., LTD. (JP) 2021-12-14 US disclosed
US-11091578-B2 Copolymer of 1,3,7-octatriene and isoprene, hydride thereof, and method for producing said copolymer KURARAY CO., LTD. (JP) 2021-08-17 US disclosed
US-10995249-B2 Tire with reduced cavity noise HANKOOK TIRE CO., LTD. 2021-05-04 US disclosed
US-20090263631-A1 FILM FORMING COMPOSITION FOR NANOIMPRINTING AND METHOD FOR PATTERN FORMATION TOKYO OHKA KOGYO CO., LTD. (JP) 2009-10-22 US disclosed
US-20090014845-A1 FILM-FORMING COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2009-01-15 US disclosed
US-7169327-B2 Composite particle for dielectrics, ultramicroparticulate composite resin particle, composition for forming dielectrics and use thereof JSR CORPORATION (JP) 2007-01-30 US disclosed
EP-1566368-A2 Glass powder-containing resin composition, transfer film and process for manufacturing a plasma display panel comprising the transfer film JSR Corporation (JP) 2005-08-24 EP disclosed
US-6930393-B2 hydrolyzable silicon compound or at least one product resulting from at least partial hydrolysis condensation of the silicon compound SHIN-ETSU CHEMICAL CO. LTD. (JP) 2005-08-16 US disclosed
CN-1536023-A Porous membrane shaping composition, preparation method of porous membrane, porous membrane intercalation insulating film and semiconductor device ��Խ��ѧ��ҵ��ʽ���� 2004-10-13 CN disclosed
US-20040195660-A1 Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2004-10-07 US disclosed
EP-1387367-A1 COMPOSITE PARTICLE FOR DIELECTRICS, ULTRAMICROPARTICULATE COMPOSITE RESIN PARTICLE, COMPOSITION FOR FORMING DIELECTRICS AND USE THEREOF JSR Corporation (JP) 2004-02-04 EP disclosed
US-20030151032-A1 Composite particle for dielectrics, ultramicroparticulate composite resin particle, composition for forming dielectrics and use thereof JSR CORPORATION (JP) 2003-08-14 US disclosed
US-5242972-A Acidic fluoropolymer is reacted with epoxysilane, weather resistant films KANSAI PAINT CO., LTD. (JP) 1993-09-07 US disclosed