SCHEMBL15344246

SCHEMBL15344246

COSc1cc(OC(C)(C)C)ccc1OC(C)(C)C

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.36
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
CA14 Q9ULX7 1/20 0.31
NPC1 O15118 1/20 0.30
LMNA P02545 1/20 0.30
PKM P14618 1/20 0.30
HTT P42858 1/20 0.30
RAB9A P51151 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15344264 0.81 KIF11 (0.38) KIF11MEN1KMT2ASMN1; SMN2NPC1
SCHEMBL24069021 0.75 FGFR2 (0.47) MEN1KMT2ASMN1; SMN2NPC1LMNA
SCHEMBL3824427 0.74 KIF11 (0.43) KIF11MEN1KMT2ASMN1; SMN2CA12
SCHEMBL3789460 0.71 KIF11 (0.41) KIF11MEN1KMT2A
SCHEMBL14805871 0.71 CA2 (0.64) KIF11MEN1KMT2ASMN1; SMN2CA12
SCHEMBL15341305 0.71 KIF11 (0.41) KIF11MEN1KMT2ASMN1; SMN2CA12
SCHEMBL15355206 0.71 SLC6A2 (0.34) KIF11MEN1KMT2ACA12CA1
SCHEMBL6231813 0.71 ALDH1A1 (0.44) KIF11MEN1KMT2ASMN1; SMN2CA12
SCHEMBL15355146 0.70
SCHEMBL23934150 0.70 ALDH1A1 (0.42) KIF11MEN1KMT2ASMN1; SMN2CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130280912-A1 SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING THE SAME AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-10-24 US disclosed