SCHEMBL15344264

SCHEMBL15344264

CSc1cc(OC(C)(C)C)ccc1OC(C)(C)C

nearest known ligand 0.38

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.38
GAA P10253 1/20 0.33
NPC1 O15118 1/20 0.31
LMNA P02545 1/20 0.31
PKM P14618 1/20 0.31
HTT P42858 1/20 0.31
RAB9A P51151 1/20 0.31
SLC6A4 P31645 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
ALDH1A1 P00352 2/20 0.30
CYP3A4 P08684 1/20 0.30
TSHR P16473 1/20 0.30
HSD17B10 Q99714 1/20 0.30
AR P10275 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15344246 0.81 KIF11 (0.36) KIF11NPC1LMNAPKMHTT
SCHEMBL3824427 0.77 KIF11 (0.43) KIF11SLC6A4SMN1; SMN2MEN1KMT2A
SCHEMBL13019882 0.77 ALDH1A1 (0.51) KIF11SLC6A4ALDH1A1CYP3A4TSHR
SCHEMBL11853799 0.74 SMN1; SMN2 (0.39) GAALMNASLC6A4SMN1; SMN2MEN1
SCHEMBL6231813 0.74 ALDH1A1 (0.44) KIF11GAALMNAHTTSMN1; SMN2
SCHEMBL15341305 0.74 KIF11 (0.41) KIF11SLC6A4SMN1; SMN2MEN1KMT2A
SCHEMBL3789460 0.74 KIF11 (0.41) KIF11SLC6A4MEN1KMT2AALDH1A1
SCHEMBL15344307 0.72 KIF11 (0.40) KIF11SLC6A4SMN1; SMN2MEN1KMT2A
SCHEMBL3790261 0.69 KIF11 (0.41) KIF11SLC6A4MEN1KMT2ACYP3A4
SCHEMBL15341306 0.69 KIF11 (0.41) KIF11SLC6A4AR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130280912-A1 SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING THE SAME AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-10-24 US disclosed