SCHEMBL15470569

SCHEMBL15470569

C=C(C)C(=O)OC(C)(C)C1CC(C)=C(C)C1C

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15470568 0.78 ALDH1A1 (0.35) ALDH1A1
SCHEMBL15470567 0.76
SCHEMBL15470570 0.75 ALDH1A1 (0.35) ALDH1A1
SCHEMBL15470582 0.74 ALDH1A1 (0.32) ALDH1A1
SCHEMBL15470563 0.73 LMNA (0.32) ALDH1A1
SCHEMBL15470584 0.71 ALDH1A1 (0.31) ALDH1A1
SCHEMBL15470586 0.70 ALOX15 (0.30)
SCHEMBL15470574 0.70
SCHEMBL15470548 0.69 LMNA (0.38) ALDH1A1
SCHEMBL15470553 0.69 ALDH1A1 (0.32) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed