Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.37 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.32 |
| ▸ | STAT3 | P40763 | 1/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14825876 | 0.81 | HSP90AA1 (0.35) | LMNATSHR | |
| SCHEMBL15470634 | 0.79 | LMNA (0.39) | LMNACYP3A4ALOX15PTPN1MEN1 | |
| SCHEMBL15470644 | 0.77 | LMNA (0.41) | LMNACYP3A4ALOX15PTPN1MEN1 | |
| SCHEMBL6304031 | 0.77 | LMNA (0.43) | LMNACYP3A4ALOX15PTPN1MEN1 | |
| SCHEMBL15470538 | 0.76 | LMNA (0.40) | LMNACYP3A4ALOX15PTPN1MEN1 | |
| SCHEMBL3503694 | 0.74 | LMNA (0.44) | LMNACYP3A4ALOX15PTPN1MEN1 | |
| SCHEMBL29655401 | 0.74 | LMNA (0.44) | LMNACYP3A4ALOX15PTPN1MEN1 | |
| SCHEMBL29318958 | 0.72 | TSHR (0.39) | ALDH1A1TSHR | |
| SCHEMBL5604543 | 0.71 | CES2 (0.51) | LMNACYP3A4ALOX15PTPN1MEN1 | |
| SCHEMBL3504597 | 0.70 | LMNA (0.50) | LMNACYP3A4ALOX15PTPN1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9075308-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20140045122-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-13 | — | — | US | disclosed |