Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSP90AA1 | P07900 | 2/20 | 0.35 |
| ▸ | HSP90AB1 | P08238 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | OXTR | P30559 | 1/20 | 0.35 |
| ▸ | NR1D1 | P20393 | 6/20 | 0.34 |
| ▸ | ADRB2 | P07550 | 2/20 | 0.33 |
| ▸ | ADRB1 | P08588 | 2/20 | 0.33 |
| ▸ | ADRB3 | P13945 | 2/20 | 0.33 |
| ▸ | XIAP | P98170 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
| ▸ | CXCR5 | P32302 | 1/20 | 0.31 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15470646 | 0.81 | LMNA (0.37) | TSHRLMNA | |
| SCHEMBL92329 | 0.79 | TSHR (0.37) | HSP90AA1HSP90AB1TSHRNR1D1ADRB2 | |
| SCHEMBL29318958 | 0.77 | TSHR (0.39) | HSP90AA1HSP90AB1TSHRADRB2ADRB1 | |
| SCHEMBL14825593 | 0.76 | NR1D1 (0.32) | NR1D1ADRB2ADRB1ADRB3HRH3 | |
| SCHEMBL14825875 | 0.75 | NPSR1 (0.39) | TSHR | |
| SCHEMBL15958400 | 0.75 | CXCR5 (0.39) | HSP90AA1HSP90AB1TSHRADRB2ADRB1 | |
| SCHEMBL14827405 | 0.74 | RORC (0.34) | TSHRADRB2ADRB1ADRB3LMNA | |
| SCHEMBL10262747 | 0.72 | MTNR1A (0.40) | HSP90AA1HSP90AB1NR1D1 | |
| SCHEMBL12416486 | 0.72 | CTSV (0.40) | — | |
| SCHEMBL13126080 | 0.71 | TSHR (0.37) | TSHRADRB2ADRB1ADRB3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8574817-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20130084529-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-04 | — | — | US | disclosed |