SCHEMBL15470644

SCHEMBL15470644

CCC(C)c1ccc(C(=O)OC(C)(C)C2CC=C(C)CC2)cc1

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.41
CYP3A4 P08684 2/20 0.41
ALOX15 P16050 2/20 0.41
NPSR1 Q6W5P4 1/20 0.38
CES2 O00748 1/20 0.37
PTPN1 P18031 1/20 0.36
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
MAPK1 P28482 1/20 0.36
CHRNA7 P36544 1/20 0.36
STAT3 P40763 1/20 0.36
ALDH1A1 P00352 2/20 0.34
TSHR P16473 2/20 0.34
POLB P06746 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13137696 0.82 NPSR1 (0.43) LMNANPSR1MEN1KMT2AALDH1A1
SCHEMBL683332 0.81 NPSR1 (0.42) LMNANPSR1MEN1KMT2AALDH1A1
SCHEMBL5604543 0.81 CES2 (0.51) LMNACYP3A4ALOX15CES2PTPN1
SCHEMBL22283370 0.80 ELANE (0.46) LMNACYP3A4ALOX15CES2PTPN1
SCHEMBL15470537 0.78 LMNA (0.46) LMNACYP3A4ALOX15CES2PTPN1
SCHEMBL14825875 0.78 NPSR1 (0.39) NPSR1MEN1KMT2AALDH1A1TSHR
SCHEMBL15470646 0.77 LMNA (0.37) LMNACYP3A4ALOX15CES2PTPN1
SCHEMBL129843 0.74 LMNA (0.53) LMNACYP3A4ALOX15CES2PTPN1
SCHEMBL17389214 0.74 LMNA (0.53) LMNACYP3A4ALOX15CES2PTPN1
SCHEMBL30799183 0.74 LMNA (0.47) LMNACYP3A4ALOX15CES2PTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed