SCHEMBL15499223

SCHEMBL15499223

C=Cc1ccc(C(O)(C(F)(F)F)C(F)(F)F)c(C)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.41
NR1H2 P55055 2/20 0.37
NR1H3 Q13133 2/20 0.37
AR P10275 3/20 0.36
TP53 P04637 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
MAPK1 P28482 2/20 0.36
HSD17B10 Q99714 2/20 0.36
ALOX15 P16050 1/20 0.36
TSHR P16473 1/20 0.36
TRPA1 O75762 1/20 0.35
KDM4E B2RXH2 2/20 0.33
MAPT P10636 2/20 0.33
ALDH1A1 P00352 2/20 0.33
PDE4A P27815 1/20 0.33
LMNA P02545 1/20 0.33
HTT P42858 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15496938 0.86 SMN1; SMN2 (0.41) SMN1; SMN2NR1H2NR1H3ARTP53
SCHEMBL15496943 0.85 AR (0.41) SMN1; SMN2ARTP53TDP1TRPA1
SCHEMBL15499232 0.81 TRPA1 (0.40) SMN1; SMN2NR1H2NR1H3ARMEN1
SCHEMBL15499222 0.81 KIF11 (0.37) SMN1; SMN2NR1H2NR1H3ARMEN1
SCHEMBL15499231 0.79 TRPA1 (0.54) SMN1; SMN2NR1H2NR1H3TDP1MEN1
SCHEMBL15496924 0.77 TRPA1 (0.43) SMN1; SMN2NR1H2NR1H3MEN1KMT2A
SCHEMBL15496934 0.77 SMN1; SMN2 (0.35) SMN1; SMN2NR1H2NR1H3ARMEN1
SCHEMBL24719100 0.76 MEN1 (0.58) SMN1; SMN2NR1H2NR1H3ARMEN1
SCHEMBL1333739 0.76 SMN1; SMN2 (0.61) SMN1; SMN2ARTP53TDP1MEN1
SCHEMBL1204171 0.76 TP53 (0.42) SMN1; SMN2TP53TDP1ALOX15TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9152050-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-06 US disclosed
US-20140065546-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-06 US disclosed