SCHEMBL15499231

SCHEMBL15499231

C=Cc1ccc(C(O)(C(F)(F)F)C(F)(F)F)c(OC)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 1/20 0.54
APP P05067 1/20 0.36
ALDH1A1 P00352 4/20 0.36
TRIM24 O15164 1/20 0.36
HPGD P15428 1/20 0.36
ALDH5A1 P51649 1/20 0.36
ABAT P80404 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
TRIM33 Q9UPN9 1/20 0.36
PGR P06401 1/20 0.36
RORA P35398 1/20 0.36
RORC P51449 1/20 0.36
RORB Q92753 1/20 0.36
TSHR P16473 1/20 0.35
TYR P14679 1/20 0.35
NFE2L2 Q16236 1/20 0.35
CYP1A1 P04798 1/20 0.35
PTGS1 P23219 1/20 0.35
PTGS2 P35354 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15496918 0.88 TRPA1 (0.50) TRPA1APPALDH1A1PGRRORA
SCHEMBL15496917 0.86 TRPA1 (0.53) TRPA1APPALDH1A1TRIM24HPGD
SCHEMBL15499233 0.82 KDM4E (0.40) TRPA1ALDH1A1HPGDPTGS1SMN1; SMN2
SCHEMBL15499223 0.79 SMN1; SMN2 (0.41) TRPA1ALDH1A1HPGDTDP1TSHR
SCHEMBL3536793 0.78 NR3C1 (0.46) TRPA1PGRNR3C2NR3C1
SCHEMBL15499222 0.77 KIF11 (0.37) TRPA1ALDH1A1HPGDRORCTSHR
SCHEMBL10685589 0.77 SMN1; SMN2 (0.54) ALDH1A1PGRRORARORCRORB
SCHEMBL17287097 0.77 CA12 (0.48) ALDH1A1HPGDTSHRCYP1A1KMT2A
SCHEMBL15499232 0.77 TRPA1 (0.40) TRPA1APPALDH1A1HPGDTSHR
SCHEMBL7099157 0.76 ALDH1A1 (0.45) ALDH1A1HPGDPGRRORARORC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9152050-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-06 US disclosed
US-20140065546-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-06 US disclosed