SCHEMBL15499232

SCHEMBL15499232

C=Cc1ccc(C(O)(C(F)(F)F)C(F)(F)F)c(O)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.35
NQO2 P16083 1/20 0.35
ALDH1A1 P00352 2/20 0.34
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
KDM4E B2RXH2 3/20 0.34
MAPT P10636 2/20 0.34
MAPK1 P28482 2/20 0.34
NR1H2 P55055 2/20 0.34
NR1H3 Q13133 2/20 0.34
LMNA P02545 1/20 0.34
HTT P42858 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
HSD17B10 Q99714 2/20 0.33
KCNJ11 Q14654 2/20 0.33
GLA P06280 1/20 0.33
POLB P06746 1/20 0.33
GAA P10253 1/20 0.33
HPGD P15428 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15496924 0.86 TRPA1 (0.43) TRPA1SMN1; SMN2NQO2ALDH1A1MEN1
SCHEMBL26793683 0.83 TRPA1 (0.47) TRPA1NQO2ALDH1A1MEN1KMT2A
SCHEMBL15496927 0.83 TRPA1 (0.41) TRPA1SMN1; SMN2NQO2ALDH1A1KDM4E
SCHEMBL15499222 0.82 KIF11 (0.37) TRPA1SMN1; SMN2ALDH1A1MEN1KMT2A
SCHEMBL15499223 0.81 SMN1; SMN2 (0.41) TRPA1SMN1; SMN2ALDH1A1MEN1KMT2A
SCHEMBL26787131 0.79 TRPA1 (0.38) TRPA1NQO2ALDH1A1LCK
SCHEMBL15496934 0.79 SMN1; SMN2 (0.35) TRPA1SMN1; SMN2ALDH1A1MEN1KMT2A
SCHEMBL15496938 0.77 SMN1; SMN2 (0.41) TRPA1SMN1; SMN2ALDH1A1MEN1KMT2A
SCHEMBL15499231 0.77 TRPA1 (0.54) TRPA1SMN1; SMN2NQO2ALDH1A1MEN1
SCHEMBL30920089 0.76 ALDH1A1 (0.48) TRPA1SMN1; SMN2ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9568821-B2 Patterning process SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-02-14 US disclosed
US-9229319-B2 Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-01-05 US disclosed
US-9229319-B2 Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-01-05 US disclosed
US-9152050-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-06 US disclosed
US-20150234278-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-08-20 US disclosed
US-20150177613-A1 PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2015-06-25 US disclosed
US-20150177613-A1 PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2015-06-25 US disclosed
US-20140065546-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-06 US disclosed