SCHEMBL15524747

SCHEMBL15524747

C=C(C)C(=O)[CH]CCCC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.41
TSHR P16473 5/20 0.39
F7 P08709 1/20 0.36
F3 P13726 1/20 0.36
CES1 P23141 2/20 0.34
CES2 O00748 2/20 0.33
THRA P10827 1/20 0.33
THRB P10828 1/20 0.33
HPGD P15428 1/20 0.33
MEN1 O00255 1/20 0.33
CYP3A4 P08684 1/20 0.33
KMT2A Q03164 1/20 0.33
EP300 Q09472 1/20 0.33
GMNN O75496 1/20 0.32
USP2 O75604 1/20 0.32
LMNA P02545 1/20 0.32
CYP1A2 P05177 1/20 0.32
POLB P06746 1/20 0.32
MAPT P10636 1/20 0.32
CYP2C9 P11712 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28565937 0.93 TSHR (0.42) ALDH1A1TSHRF7F3MEN1
SCHEMBL19921872 0.91 TSHR (0.46) TSHRF7F3MEN1CYP3A4
SCHEMBL4535974 0.86
SCHEMBL7132092 0.82 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL6409271 0.78 TSHR (0.43) ALDH1A1TSHRCYP3A4USP2LMNA
SCHEMBL7757940 0.76
SCHEMBL8822985 0.76
SCHEMBL49112 0.75
SCHEMBL4393421 0.75
SCHEMBL125167 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2949709-B1 PLASTIC FILM LG CHEMICAL LTD (KR) 2020-04-29 EP disclosed
US-9884969-B2 Poly-rotaxane compound, photocurable coating composition, and coating film LG CHEM, LTD. (KR) 2018-02-06 US disclosed
US-9850397-B2 Plastic film LG CHEM, LTD. (KR) 2017-12-26 US disclosed
US-9499646-B2 Negative resist composition, method of forming resist pattern and complex TOKYO OHKA KOGYO CO., LTD. (JP) 2016-11-22 US disclosed
US-20160259244-A1 NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPLEX TOKYO OHKA KOGYO CO LTD (JP) 2016-09-08 US disclosed
US-9366960-B2 Negative resist composition, method of forming resist pattern, and complex TOKYO OHA KOGYO CO., LTD. (JP) 2016-06-14 US disclosed
US-20160032137-A1 PLASTIC FILM LG CHEM, LTD. (KR) 2016-02-04 US disclosed
EP-2949709-A1 PLASTIC FILM LG Chem, Ltd. (KR) 2015-12-02 EP disclosed
US-20150192851-A1 NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPLEX TOKYO OHKA KOGYO CO, LTD. (JP) 2015-07-09 US disclosed
EP-2857440-A1 HARD COATING FILM LG Chem, Ltd. (KR) 2015-04-08 EP disclosed
US-8927098-B2 Hard coating film LG CHEM, LTD. (KR) 2015-01-06 US disclosed
EP-2787010-A1 POLYROTAXANE COMPOUND, PHOTOCURABLE COATING COMPOSITION, AND COATED FILM LG Chem, Ltd. (KR) 2014-10-08 EP disclosed
US-20140080936-A1 POLY-ROTAXANE COMPOUND, PHOTOCURABLE COATING COMPOSITION, AND COATING FILM LG CHEM, LTD. (KR) 2014-03-20 US disclosed
US-20140079937-A1 HARD COATING FILM LG CHEM, LTD. (KR) 2014-03-20 US disclosed
CN-1337013-A Photosensitive composition, and optical waveguide element and process for producing the same NIPPON SHEET GLASS CO LTD (JP) 2002-02-20 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160259244-A1 NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPLEX ACTN4, CHD4, H1-4 ALDH1A1 4581/4885TSHR 2175/4885F7 591/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.