SCHEMBL15536893

SCHEMBL15536893

OCC12CC3CC(CC(Cl)(C3)C1)C2

nearest known ligand 0.56

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.45
LMNA P02545 1/20 0.45
GAA P10253 3/20 0.42
THRB P10828 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.38
GRIN2D O15399 2/20 0.35
GRIN3B O60391 2/20 0.35
GRIN1 Q05586 2/20 0.35
GRIN2A Q12879 2/20 0.35
GRIN2B Q13224 2/20 0.35
GRIN2C Q14957 2/20 0.35
GRIN3A Q8TCU5 2/20 0.35
POLB P06746 1/20 0.35
SCN9A Q15858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL602378 0.84 ALDH1A1 (0.52) ALDH1A1LMNAGAAGRIN2DGRIN3B
SCHEMBL24105950 0.78 GRIN2D (0.59) GAATHRBGRIN2DGRIN3BGRIN1
SCHEMBL7571363 0.78 GRIN2D (0.56) LMNAGAATHRBGRIN2DGRIN3B
SCHEMBL3749019 0.78 GAA (0.49) ALDH1A1GAATHRBPOLB
Hydrochloric Acid SCHEMBL30207392 0.77 GRIN2D (0.54) LMNAGAATHRBGRIN2DGRIN3B
SCHEMBL3760612 0.76 POLB (0.64) ALDH1A1LMNAGAATHRBPOLB
SCHEMBL1044999 0.76 PKM (0.48) ALDH1A1LMNAGAAGRIN2DGRIN3B
SCHEMBL18788534 0.76 PKM (0.48) ALDH1A1LMNAGAAGRIN2DGRIN3B
SCHEMBL18788533 0.76 PKM (0.48) ALDH1A1LMNAGAAGRIN2DGRIN3B
SCHEMBL5269244 0.75 THRB (0.48) LMNAGAATHRBL3MBTL1GRIN2D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20180101094-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-04-12 US disclosed
EP-2855428-A1 N-SUBSTITUTED BENZAMIDES AND THEIR USE IN THE TREATMENT OF PAIN Genentech, Inc. (US) 2015-04-08 EP disclosed
WO-2013177224-A1 N-SUBSTITUTED BENZAMIDES AND THEIR USE IN THE TREATMENT OF PAIN GENENTECH, INC. (US) 2013-11-28 WO disclosed