SCHEMBL1554380

SCHEMBL1554380

Nc1ccc(C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)c(N)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.39
GAA P10253 2/20 0.39
GLA P06280 1/20 0.39
POLB P06746 1/20 0.39
CASP1 P29466 2/20 0.34
KIF11 P52732 1/20 0.34
MAPK1 P28482 1/20 0.31
KDM4E B2RXH2 2/20 0.31
MAPT P10636 1/20 0.31
AR P10275 2/20 0.30
MEN1 O00255 1/20 0.30
ALDH1A1 P00352 1/20 0.30
SRC P12931 1/20 0.30
HPGD P15428 1/20 0.30
CASP7 P55210 1/20 0.30
KMT2A Q03164 1/20 0.30
ATM Q13315 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30
HSD17B10 Q99714 1/20 0.30
TLR9 Q9NR96 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1554371 1.00 TSHR (0.39) TSHRGAAGLAPOLBCASP1
SCHEMBL1554300 1.00 TSHR (0.39) TSHRGAAGLAPOLBCASP1
SCHEMBL30469491 0.85 TSHR (0.44) TSHRGAAGLAPOLBCASP1
SCHEMBL1050419 0.85 TSHR (0.44) TSHRGAAGLAPOLBCASP1
SCHEMBL29140652 0.84 TSHR (0.45) TSHRGAAGLAPOLBCASP1
SCHEMBL3187513 0.82 TSHR (0.45) TSHRGAAGLAPOLBCASP1
SCHEMBL30469492 0.82 TSHR (0.45) TSHRGAAGLAPOLBCASP1
SCHEMBL15320180 0.78 GLA (0.41) TSHRGAAGLAPOLBKDM4E
SCHEMBL3868549 0.78 LMNA (0.33) LMNA
Benzidine SCHEMBL8734089 0.77 KIF11 (0.42) TSHRGAAGLAPOLBKIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6927012-B2 Polyamic acid resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-08-09 US claimed
US-6875554-B2 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-04-05 US claimed
EP-1411088-B1 POLYAMIC ACID RESIN COMPOSITION NISSAN CHEMICAL IND LTD (JP) 2013-08-21 EP disclosed
EP-1329769-B1 POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION NISSAN CHEMICAL IND LTD (JP) 2011-04-27 EP disclosed
US-6927012-B2 Polyamic acid resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-08-09 US disclosed
US-6875554-B2 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2005-04-05 US disclosed
US-20040175646-A1 Polyamic acid resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2004-09-09 US disclosed
EP-1411088-A1 POLYAMIC ACID RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2004-04-21 EP disclosed
US-20040048188-A1 Positive photosensitive polyimide resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2004-03-11 US disclosed
EP-1329769-A1 POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2003-07-23 EP disclosed