Cyclooctane

Cyclooctane

SCHEMBL1576491

C1CCCCCCC1.C1COOCO1

nearest known ligand 0.33

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Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TTR P02766 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29967 0.93
SCHEMBL3741249 0.91 ALDH1A1 (0.47) TTR
SCHEMBL17180694 0.89
Hydrogen Sulfide SCHEMBL5789620 0.89 TTR (0.36) TTR
Water SCHEMBL9442576 0.89 TTR (0.36) TTR
Tetraoxane SCHEMBL3273646 0.89 TTR (0.36) TTR
SCHEMBL8994603 0.84 ALDH1A1 (0.47) TTR
Cyclopentene SCHEMBL7624239 0.80
SCHEMBL1484296 0.79
Cyclopropane SCHEMBL28703936 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113861395-A Polyester with acetal group in main chain and preparation method thereof 浙江大学 2021-12-31 CN claimed
CN-116964043-A Type II photoinitiators 阿科玛法国公司 2023-10-27 CN disclosed
CN-115836100-A Polymerizable composition, cured product, and method for producing cured product 株式会社艾迪科 2023-03-21 CN disclosed
CN-115279845-A Photoinitiator emulsion 阿科玛英国有限公司 2022-11-01 CN disclosed
CN-115210643-A Curable compositions comprising photoinitiators 阿科玛法国公司 2022-10-18 CN disclosed
CN-113861395-A Polyester with acetal group in main chain and preparation method thereof 浙江大学 2021-12-31 CN disclosed
CN-109642084-B Curable composition 株式会社艾迪科 2021-06-18 CN disclosed
CN-112334503-A Curable compositions based on multistage polymers 阿科玛法国公司 2021-02-05 CN disclosed
CN-105579436-B Onium salts and compositions comprising the same 旭化成株式会社 2020-12-22 CN disclosed
CN-107250114-B Sulfonic acid derivative compound, photoacid generator, resist composition, cationic polymerization initiator, and cationically polymerizable composition 株式会社ADEKA 2020-11-06 CN disclosed
US-6013714-A A CURABLE PHOTOPOLYMERIZABLE LIQUID MIXTURE COMPRISES AT LEAST A PHOTOREACTIVE MONOMER AND A PHOTOREACTION INITIATOR; FORMING WATER-RESISTANT, DURABLE MOLDS DSM N.V. (NL) 2000-01-11 US disclosed
US-5981616-A OXETANE COMPOUND, EPOXY COMPOUND CONSISTING OF EXPOXIDIZED POLYMERS OF CONJUGATED DIENE MONOMERS, EXPOXIDIZED COPOLYMERS OF DIENE MONOMERS AND COMPOUNDS HAVING AN ETHYLENICALLY UNSATURATED BOND, AND EXPOXIDIZED NATURAL RUBBER DSM N.V. (NL) 1999-11-09 US disclosed
EP-0892941-A1 PHOTO-CURABLE RESIN COMPOSITION DSM N.V. (NL) 1999-01-27 EP disclosed
EP-0848294-A1 Photo-curable resin composition used for photo-fabrication of three-dimensional objects DSM N.V. (NL) 1998-06-17 EP disclosed
EP-0848292-A1 Photo-curable resin composition DSM N.V. (NL) 1998-06-17 EP disclosed
EP-0848293-A1 Photo-curable resin composition DSM N.V. (NL) 1998-06-17 EP disclosed
EP-0837366-A1 Photocurable resin composition DSM N.V. (NL) 1998-04-22 EP disclosed
EP-0831127-A1 STEREOLITHOGRAPHIC RESIN COMPOSITION AND STEREOLITHOGRAPHIC METHOD ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) 1998-03-25 EP disclosed
EP-0830928-A2 Resin composition and mold made from such resin, for forming fibrous material DSM N.V. (NL) 1998-03-25 EP disclosed
WO-1997038354-A1 PHOTO-CURABLE RESIN COMPOSITION DSM N.V. (NL) 1997-10-16 WO disclosed