SCHEMBL15840358

SCHEMBL15840358

C=Cc1cccc(CNS(=O)(=O)C(F)(F)F)c1

nearest known ligand 0.47

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 8/20 0.47
CA2 P00918 3/20 0.47
CYP4F2 P78329 1/20 0.41
CYP4A11 Q02928 1/20 0.41
LMNA P02545 1/20 0.36
RAB9A P51151 1/20 0.36
GALR3 O60755 1/20 0.36
PTGS1 P23219 1/20 0.36
PTGS2 P35354 1/20 0.36
CA1 P00915 1/20 0.35
PTK2 Q05397 1/20 0.35
FAAH O00519 1/20 0.35
CA12 O43570 1/20 0.35
CA7 P43166 1/20 0.35
CA14 Q9ULX7 1/20 0.35
TP53 P04637 1/20 0.35
TDP1 Q9NUW8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL904285 0.81 CA2 (0.59) CYP19A1CA2GALR3CA1CA12
SCHEMBL15836441 0.80 BRD4 (0.44) CYP19A1CA2CA12CA7CA14
SCHEMBL22503302 0.78 EGFR (0.41) PTGS1FAAH
SCHEMBL139618 0.77 CYP19A1 (0.50) CYP19A1CA2CYP4F2CYP4A11PTGS1
SCHEMBL9573442 0.77 CYP19A1 (0.56) CYP19A1CA2CYP4F2CYP4A11CA1
SCHEMBL141066 0.77 TP53 (0.51) CYP19A1CA2CYP4F2CYP4A11TP53
SCHEMBL139610 0.77 CYP19A1 (0.50) CYP19A1CA2CYP4F2CYP4A11RAB9A
SCHEMBL19480403 0.77 FAAH (0.32) CA2CYP4F2CYP4A11FAAHTP53
SCHEMBL28218123 0.76 TP53 (0.45) LMNAFAAHTP53TDP1
SCHEMBL138364 0.76 CA2 (0.64) CYP19A1CA2LMNACA1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220220313-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-07-14 US disclosed
US-9201300-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-01 US disclosed
US-20140178818-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed