SCHEMBL15869180

SCHEMBL15869180

CCC(C)(C)Oc1ccc(C2(c3ccc(OC(C)(C)CC)cc3)CCC(C(C)(C)C3CCC(c4ccc(OC(C)(C)CC)cc4)(c4ccc(OC(C)(C)CC)cc4)CC3)CC2)cc1

nearest known ligand 0.46

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ ADORA3 P0DMS8 1/20 0.46
▸ SLC6A4 P31645 9/20 0.33
▸ SLC6A3 Q01959 6/20 0.33
▸ SLC6A2 P23975 1/20 0.32
▸ PSMB1 P20618 1/20 0.32
▸ PSMB5 P28074 1/20 0.32
▸ PSMB2 P49721 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15869205 0.84 SLC6A4 (0.44) ADORA3SLC6A4SLC6A3SLC6A2PSMB1
SCHEMBL15869179 0.84 ADORA3 (0.45) ADORA3SLC6A4SLC6A3SLC6A2
SCHEMBL20671319 0.81 ADORA3 (0.65) ADORA3SLC6A4SLC6A3SLC6A2PSMB1
SCHEMBL19431650 0.81 ADORA3 (0.65) ADORA3SLC6A4SLC6A3SLC6A2PSMB1
SCHEMBL13961331 0.77 ADORA3 (0.40) ADORA3
SCHEMBL18944160 0.77 ADORA3 (0.59) ADORA3SLC6A4SLC6A3SLC6A2PSMB1
SCHEMBL21851266 0.77 ADORA3 (0.59) ADORA3SLC6A4SLC6A3SLC6A2PSMB1
SCHEMBL20671282 0.75 ADORA3 (0.61) ADORA3SLC6A4SLC6A3SLC6A2PSMB1
SCHEMBL12205413 0.75 ADORA3 (0.61) ADORA3SLC6A4SLC6A3SLC6A2PSMB1
SCHEMBL15869181 0.75 ADORA3 (0.34) ADORA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
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