SCHEMBL15869205

SCHEMBL15869205

CC(C)(C)Oc1ccc(C2(c3ccc(OC(C)(C)C)cc3)CCC(C(C)(C)C3CCC(c4ccc(OC(C)(C)C)cc4)(c4ccc(OC(C)(C)C)cc4)CC3)CC2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SLC6A4 P31645 12/20 0.44
▸ SLC6A3 Q01959 9/20 0.44
▸ SLC6A2 P23975 2/20 0.44
▸ ADORA3 P0DMS8 1/20 0.40
▸ PDE2A O00408 2/20 0.33
▸ ACACB O00763 1/20 0.32
▸ ABL1 P00519 1/20 0.32
▸ PSMB1 P20618 1/20 0.32
▸ PSMB5 P28074 1/20 0.32
▸ PSMB2 P49721 1/20 0.32
▸ GRIN2D O15399 1/20 0.31
▸ GRIN3B O60391 1/20 0.31
▸ CHRM2 P08172 1/20 0.31
▸ CHRM1 P11229 1/20 0.31
▸ OPRM1 P35372 1/20 0.31
▸ GRIN1 Q05586 1/20 0.31
▸ KCNH2 Q12809 1/20 0.31
▸ GRIN2A Q12879 1/20 0.31
▸ GRIN2B Q13224 1/20 0.31
▸ GRIN2C Q14957 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15869180 0.84 ADORA3 (0.46) SLC6A4SLC6A3SLC6A2ADORA3PSMB1
SCHEMBL15869167 0.82 SLC6A4 (0.43) SLC6A4SLC6A3SLC6A2ADORA3PDE2A
SCHEMBL15869212 0.80 SLC6A4 (0.58) SLC6A4SLC6A3SLC6A2ADORA3PDE2A
SCHEMBL15869211 0.79 SLC6A4 (0.61) SLC6A4SLC6A3SLC6A2ADORA3PDE2A
SCHEMBL45831 0.77 ESR2 (0.53) SLC6A4SLC6A3SLC6A2GRIN2DGRIN3B
SCHEMBL15869193 0.76 MAPT (0.39) ADORA3PSMB1PSMB5PSMB2
SCHEMBL2605552 0.76 ESR2 (0.52) SLC6A4SLC6A3SLC6A2GRIN2DGRIN3B
SCHEMBL15869194 0.75 GPR174 (0.37) ADORA3ACACBPSMB1PSMB5PSMB2
SCHEMBL21335140 0.75 LTA4H (0.49) ADORA3GRIN2DGRIN3BCHRM2CHRM1
SCHEMBL15934080 0.75 ALDH1A1 (0.55) PSMB1PSMB5PSMB2OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
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