SCHEMBL15869179

SCHEMBL15869179

CCC(C)(C)Oc1ccc(C2CCC(c3ccc(OC(C)(C)CC)cc3)(c3ccc(OC(C)(C)CC)cc3)CC2)cc1

nearest known ligand 0.45

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ ADORA3 P0DMS8 1/20 0.45
▸ DRD2 P14416 1/20 0.35
▸ ESR2 Q92731 2/20 0.33
▸ SLC6A4 P31645 7/20 0.33
▸ SLC6A3 Q01959 5/20 0.33
▸ SLC6A2 P23975 2/20 0.33
▸ KDM1A O60341 1/20 0.33
▸ RCOR1 Q9UKL0 1/20 0.33
▸ S1PR3 Q99500 1/20 0.32
▸ PPARA Q07869 2/20 0.31
▸ PPARG P37231 1/20 0.31
▸ CNR2 P34972 2/20 0.31
▸ LMNA P02545 2/20 0.31
▸ CYP2C9 P11712 1/20 0.31
▸ TSHR P16473 1/20 0.31
▸ BLM P54132 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15869167 0.85 SLC6A4 (0.43) ADORA3DRD2ESR2SLC6A4SLC6A3
SCHEMBL15869180 0.84 ADORA3 (0.46) ADORA3SLC6A4SLC6A3SLC6A2
SCHEMBL20671319 0.80 ADORA3 (0.65) ADORA3ESR2SLC6A4SLC6A3SLC6A2
SCHEMBL19431650 0.80 ADORA3 (0.65) ADORA3ESR2SLC6A4SLC6A3SLC6A2
SCHEMBL18944160 0.75 ADORA3 (0.59) ADORA3ESR2SLC6A4SLC6A3SLC6A2
SCHEMBL21851266 0.75 ADORA3 (0.59) ADORA3ESR2SLC6A4SLC6A3SLC6A2
SCHEMBL20671282 0.74 ADORA3 (0.61) ADORA3ESR2SLC6A4SLC6A3SLC6A2
SCHEMBL12205413 0.74 ADORA3 (0.61) ADORA3ESR2SLC6A4SLC6A3SLC6A2
SCHEMBL19431838 0.72 ADORA3 (0.55) ADORA3ESR2SLC6A4SLC6A3SLC6A2
SCHEMBL15869192 0.72 DRD2 (0.33) ADORA3DRD2ESR2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
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