SCHEMBL15914848

SCHEMBL15914848

[SiH3]C1(C2CCCC2)CCCCC1C1CCCC1

nearest known ligand 0.40

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.40
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15915674 0.93 HSD17B10 (0.35) HSD17B10ALDH1A1
SCHEMBL5409872 0.71 HSD17B10 (0.40) HSD17B10ALDH1A1
SCHEMBL14675993 0.68 HSD17B10 (0.38) HSD17B10
SCHEMBL11014352 0.68 CYP19A1 (0.42) HSD17B10
SCHEMBL10816509 0.68 HSD17B10 (0.59) HSD17B10
SCHEMBL4562939 0.68 HSD17B10 (0.59) HSD17B10
SCHEMBL2992831 0.67 HSD17B10 (0.36) HSD17B10ALDH1A1
SCHEMBL11348086 0.65 ALDH1A1 (0.35) HSD17B10ALDH1A1
SCHEMBL2995208 0.64 CYP19A1 (0.39) HSD17B10
SCHEMBL15914499 0.64 LMNA (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed