Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | ATM | Q13315 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | ACE | P12821 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | PRKCA | P17252 | 3/20 | 0.32 |
| ▸ | PRKCE | Q02156 | 1/20 | 0.32 |
| ▸ | PRKCQ | Q04759 | 1/20 | 0.32 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.32 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.30 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1424633 | 0.85 | CYP3A4 (0.41) | CYP3A4TSHRATMTDP1MAPT | |
| SCHEMBL996843 | 0.83 | KDM4E (0.44) | MAPTLMNAKDM4EDUSP3MEN1 | |
| SCHEMBL29930756 | 0.81 | MAPT (0.41) | CYP3A4TSHRATMTDP1MAPT | |
| SCHEMBL6738675 | 0.81 | TSHR (0.43) | CYP3A4TSHRATMTDP1MAPT | |
| SCHEMBL2127406 | 0.79 | MAPT (0.58) | CYP3A4TSHRATMTDP1MAPT | |
| SCHEMBL331859 | 0.79 | LMNA (0.33) | CYP3A4TSHRATMTDP1MAPT | |
| SCHEMBL15247766 | 0.79 | ALDH1A1 (0.39) | CYP3A4TSHRATMTDP1MAPT | |
| SCHEMBL99261 | 0.79 | ALDH1A1 (0.56) | LMNAALDH1A1ACEPRKCAPRKCE | |
| SCHEMBL17938161 | 0.79 | ALDH1A1 (0.39) | CYP3A4TSHRATMTDP1MAPT | |
| SCHEMBL1593724 | 0.79 | TSHR (0.43) | CYP3A4TSHRATMTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9122152-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICALS CO., LTD. (JP) | 2015-09-01 | — | — | US | claimed |
| US-9152048-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-10-06 | — | — | US | disclosed |
| US-9122152-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICALS CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-20110091809-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-04-21 | — | — | US | disclosed |