Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 1/20 | 0.32 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
| ▸ | RORA | P35398 | 1/20 | 0.31 |
| ▸ | RORC | P51449 | 1/20 | 0.31 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.31 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL3626396 | 0.97 | GPR3 (0.33) | ELANEPTPN1RORARORCNR1H2 | |
| SCHEMBL270055 | 0.96 | ELANE (0.32) | ELANEPTPN1RORARORCNR1H2 | |
| Trifluoromethanesulfonic Acid SCHEMBL3626393 | 0.94 | RORA (0.31) | RORARORCNR1H2NR1H4 | |
| SCHEMBL3132397 | 0.94 | ELANE (0.32) | ELANEPTPN1RORARORCNR1H2 | |
| SCHEMBL3139795 | 0.92 | CA1 (0.32) | ELANEPTPN1RORARORCNR1H2 | |
| SCHEMBL3127138 | 0.92 | CA1 (0.32) | ELANEPTPN1RORARORCNR1H2 | |
| Trifluoromethanesulfonic Acid SCHEMBL36034 | 0.88 | GPR3 (0.38) | PTPN1RORARORCNR1H2NR1H4 | |
| Trifluoromethanesulfonic Acid SCHEMBL31564951 | 0.88 | GPR3 (0.38) | PTPN1RORARORCNR1H2NR1H4 | |
| Trifluoromethanesulfonic Acid SCHEMBL547976 | 0.85 | GPR3 (0.38) | PTPN1RORARORCNR1H2NR1H4 | |
| Trifluoromethanesulfonic Acid SCHEMBL29402880 | 0.85 | GPR3 (0.38) | PTPN1RORARORCNR1H2NR1H4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110091818-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20100279226-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-11-04 | — | — | US | disclosed |
| US-20100273113-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-10-28 | — | — | US | disclosed |
| US-20100273112-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-10-28 | — | — | US | disclosed |