Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 1/20 | 0.38 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | CA9 | Q16790 | 2/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | HTR6 | P50406 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.32 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.32 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.32 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | RORA | P35398 | 1/20 | 0.32 |
| ▸ | RORC | P51449 | 1/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL31564951 | 1.00 | GPR3 (0.38) | GPR3PTPN1CA1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL547976 | 0.97 | GPR3 (0.38) | GPR3PTPN1CA1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL29402880 | 0.97 | GPR3 (0.38) | GPR3PTPN1CA1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL3626396 | 0.91 | GPR3 (0.33) | GPR3PTPN1RORARORCNR1H2 | |
| Trifluoromethanesulfonic Acid SCHEMBL66197 | 0.91 | GPR3 (0.42) | GPR3PTPN1CA1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL31235599 | 0.91 | GPR3 (0.42) | GPR3PTPN1CA1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL7863367 | 0.89 | HPRT1 (0.38) | GPR3PTPN1CA1CA2CA9 | |
| SCHEMBL1593370 | 0.88 | ELANE (0.32) | PTPN1CA1CA2CA9RECQL | |
| SCHEMBL270055 | 0.86 | ELANE (0.32) | PTPN1CA1CA2RORARORC | |
| Trifluoromethanesulfonic Acid SCHEMBL3626393 | 0.85 | RORA (0.31) | RORARORCNR1H2NR1H4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 350 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4714988-A1 | FLUORINE-CONTAINING POLYMER, COMPOSITION FOR FORMING FLUORINE-CONTAINING RESIN FILM, FLUORINE-CONTAINING RESIN FILM, COMPOSITION FOR FORMING RESIST PATTERN, METHOD FOR FORMING RESIST PATTERN, COMPOSITION FOR FORMING RESIST UPPER LAYER FILM, METHOD FOR DECOMPOSING FLUORINE-CONTAINING POLYMER, FLUORINE-CONTAINING POLYMERIZABLE MONOMER, COMPOUND, AND METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMERIZABLE MONOMER | Central Glass Company, Limited (JP) | 2026-03-25 | — | — | EP | disclosed |
| EP-4714990-A1 | COPOLYMER, POLYMER FOR WATER-REPELLENT AGENT, COMPOSITION FOR FORMING WATER-REPELLENT FILM, RESIN FILM, AND METHOD FOR FORMING RESIST PATTERN | Central Glass Company, Limited (JP) | 2026-03-25 | — | — | EP | disclosed |
| WO-2024248136-A1 | COPOLYMER, POLYMER FOR WATER-REPELLENT AGENT, COMPOSITION FOR FORMING WATER-REPELLENT FILM, RESIN FILM, AND METHOD FOR FORMING RESIST PATTERN | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| WO-2024248135-A1 | FLUORINE-CONTAINING POLYMER, COMPOSITION FOR FORMING FLUORINE-CONTAINING RESIN FILM, FLUORINE-CONTAINING RESIN FILM, COMPOSITION FOR FORMING RESIST PATTERN, METHOD FOR FORMING RESIST PATTERN, COMPOSITION FOR FORMING RESIST UPPER LAYER FILM, METHOD FOR DECOMPOSING FLUORINE-CONTAINING POLYMER, FLUORINE-CONTAINING POLYMERIZABLE MONOMER, COMPOUND, AND METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMERIZABLE MONOMER | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| EP-2584409-B1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2021-04-28 | — | — | EP | disclosed |
| EP-2060600-B1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO LTD (JP) | 2017-12-27 | — | — | EP | disclosed |
| EP-2093213-B1 | Positive resist composition and method of forming a resist pattern using the same | TOKYO OHKA KOGYO CO LTD (JP) | 2017-10-04 | — | — | EP | disclosed |
| US-9618842-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9618843-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9494860-B2 | Resist composition, method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-6811961-B2 | PHOTORESIST RELEIF IMAGES; MIXTURE OF RESIN AND ACID GENERATORS | SHIPLEY COMPANY, L.L.C. | 2004-11-02 | — | — | US | disclosed |
| WO-2002069039-A9 | PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING | SHIPLEY CO LLC (US) | 2004-05-06 | — | — | WO | disclosed |
| US-6689529-B2 | Method for measuring diffusion of photogenerated catalyst in chemically amplified resists | YALE UNIVERSITY | 2004-02-10 | — | — | US | disclosed |
| US-6664022-B1 | Forming relief image on substrate by coating with amplified positive resin and iodinium or sulfonium compound comprising naphthyl, thienyl or pentafluorophenyl substituents; exposure to patterned activating radiation; development | SHIPLEY COMPANY, L.L.C. | 2003-12-16 | — | — | US | disclosed |
| EP-1277085-A1 | METHOD FOR MEASURING DIFFUSION OF PHOTOGENERATED CATALYST IN CHEMICALLY AMPLIFIED RESISTS | YALE UNIVERSITY (US) | 2003-01-22 | — | — | EP | disclosed |
| US-20030013049-A1 | Photoacid generator systems for short wavelength imaging | SHIPLEY COMPANY, L.L.C. | 2003-01-16 | — | — | US | disclosed |
| WO-2002069039-A2 | PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-06 | — | — | WO | disclosed |
| WO-2002019033-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-07 | — | — | WO | disclosed |
| US-20020001768-A1 | Method for measuring diffusion of photogenerated catalyst in chemically amplified resists | YALE UNIVERSITY | 2002-01-03 | — | — | US | disclosed |
| WO-2001079932-A1 | METHOD FOR MEASURING DIFFUSION OF PHOTOGENERATED CATALYST IN CHEMICALLY AMPLIFIED RESISTS | YALE UNIVERSITY (US) | 2001-10-25 | — | — | WO | disclosed |