Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPA1 | O75762 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 13/20 | 0.33 |
| ▸ | CA2 | P00918 | 13/20 | 0.33 |
| ▸ | MMP1 | P03956 | 7/20 | 0.33 |
| ▸ | MMP2 | P08253 | 7/20 | 0.33 |
| ▸ | MMP9 | P14780 | 7/20 | 0.33 |
| ▸ | MMP8 | P22894 | 7/20 | 0.33 |
| ▸ | MMP13 | P45452 | 7/20 | 0.33 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.32 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1594212 | 0.95 | TRPA1 (0.35) | TRPA1ATMKEAP1NFE2L2HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL5356654 | 0.84 | TRPA1 (0.45) | TRPA1ATMKEAP1NFE2L2HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL112239 | 0.84 | TRPA1 (0.45) | TRPA1ATMKEAP1NFE2L2HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL8088610 | 0.81 | TRPA1 (0.42) | TRPA1ATMKEAP1NFE2L2HTT | |
| Sulfuric Acid SCHEMBL482696 | 0.79 | TRPA1 (0.43) | TRPA1ATMKEAP1NFE2L2HTT | |
| Sulfuric Acid SCHEMBL3797183 | 0.79 | TRPA1 (0.43) | TRPA1ATMKEAP1NFE2L2HTT | |
| Sulfuric Acid SCHEMBL15345267 | 0.77 | HTT (0.39) | TRPA1ATMKEAP1NFE2L2HTT | |
| Hydrogen Sulfide SCHEMBL29745849 | 0.77 | F2 (0.38) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL6743597 | 0.75 | CA2 (0.36) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL3129927 | 0.75 | ENPP1 (0.38) | CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110091818-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20100273113-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-10-28 | — | — | US | disclosed |
| US-20100273112-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-10-28 | — | — | US | disclosed |