SCHEMBL15935643

SCHEMBL15935643

O=S(=O)(O)CC(F)(F)OCc1ccc2ccccc2c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RORC P51449 1/20 0.41
RAB9A P51151 2/20 0.40
SLC1A3 P43003 1/20 0.40
SLC1A2 P43004 1/20 0.40
SLC1A1 P43005 1/20 0.40
PTPN1 P18031 2/20 0.39
ADAMTS4 O75173 1/20 0.38
MMP13 P45452 1/20 0.38
CYP1A2 P05177 2/20 0.38
NPC1 O15118 1/20 0.38
GAA P10253 1/20 0.38
MAPT P10636 1/20 0.38
XBP1 P17861 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
CYP2A6 P11509 1/20 0.38
MAOB P27338 1/20 0.37
ALOX5 P09917 3/20 0.37
HTR2A P28223 2/20 0.37
HTR2C P28335 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12968558 0.82 RORC (0.43) RORCRAB9ASLC1A3SLC1A2SLC1A1
SCHEMBL1595059 0.80 RORC (0.41) RORCRAB9ASLC1A3SLC1A2SLC1A1
SCHEMBL1595055 0.80 RORC (0.43) RORCRAB9ASLC1A3SLC1A2SLC1A1
SCHEMBL10083976 0.78 RORC (0.40) RORCRAB9ASLC1A3SLC1A2SLC1A1
SCHEMBL18103422 0.76 CYP1A2 (0.48) RORCRAB9ASLC1A3SLC1A2SLC1A1
SCHEMBL3289614 0.75 RORC (0.44) RORCRAB9ASLC1A3SLC1A2SLC1A1
SCHEMBL3289610 0.75 RORC (0.42) RORCRAB9ASLC1A3SLC1A2SLC1A1
SCHEMBL4120414 0.74 RAB9A (0.40) RORCRAB9ASLC1A3SLC1A2SLC1A1
SCHEMBL18722948 0.74 RAB9A (0.45) RAB9ASLC1A3SLC1A2SLC1A1CYP1A2
SCHEMBL10267882 0.74 CYP1A2 (0.43) RORCRAB9ASLC1A3SLC1A2SLC1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2014119698-A1 PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-07 WO disclosed