Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 2/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | XBP1 | P17861 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.40 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.40 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.40 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.39 |
| ▸ | SLC13A5 | Q86YT5 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | RORC | P51449 | 1/20 | 0.37 |
| ▸ | MAOB | P27338 | 1/20 | 0.37 |
| ▸ | CASR | P41180 | 1/20 | 0.37 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.37 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL384179 | 0.80 | PTPN1 (0.44) | PTPN1SLC13A5CYP1A2CYP2A6 | |
| SCHEMBL12968558 | 0.79 | RORC (0.43) | RAB9ANPC1GAAMAPTXBP1 | |
| SCHEMBL18785761 | 0.78 | PTPN7 (0.49) | RAB9ANPC1GAAMAPTXBP1 | |
| SCHEMBL18722948 | 0.77 | RAB9A (0.45) | RAB9ASLC1A3SLC1A2SLC1A1CYP1A2 | |
| SCHEMBL1595055 | 0.77 | RORC (0.43) | RAB9ANPC1GAAMAPTXBP1 | |
| SCHEMBL1595059 | 0.77 | RORC (0.41) | RAB9ANPC1GAAMAPTXBP1 | |
| SCHEMBL2605925 | 0.76 | SLC1A3 (0.42) | RAB9ANPC1GAAMAPTXBP1 | |
| SCHEMBL10083976 | 0.75 | RORC (0.40) | RAB9ANPC1GAAMAPTXBP1 | |
| SCHEMBL15935643 | 0.74 | RORC (0.41) | RAB9ANPC1GAAMAPTXBP1 | |
| SCHEMBL21235702 | 0.74 | KDM4E (0.44) | RAB9ASLC1A3SLC1A2SLC1A1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-20230127914-A1 | RESIST PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-9097969-B2 | Compound, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-04 | — | — | US | disclosed |
| US-9075304-B2 | Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-9023581-B2 | Resist composition, method of forming resist pattern, polymeric compound, and compound | TOKYO OHKA KOGYO CO., LTD (JP) | 2015-05-05 | — | — | US | disclosed |
| US-9017919-B2 | Resist composition, method of forming resist pattern, novel compound and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20140017617-A1 | METHOD OF PRODUCING AMMONIUM SALT COMPOUND, METHOD OF PRODUCING COMPOUND, AND COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-01-16 | — | — | US | disclosed |
| US-20130089819-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-11 | — | — | US | disclosed |
| US-8367299-B2 | Resist composition, method of forming resist pattern, compound and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-20120107744-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120015297-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO.CO., LTD. (JP) | 2012-01-19 | — | — | US | disclosed |
| US-20120009521-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120107744-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND ACID GENERATOR | SLC11A2, ABCC1, ASIC1 | RAB9A 671/4885NPC1 2392/4885GAA 2732/4885 |
| US-20120009521-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR | RER1, RFC2, RFC1 | RAB9A 63/4885NPC1 3147/4885GAA 2367/4885 |
| US-20120015297-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | ASIC1, SLC11A2, RER1 | RAB9A 797/4885NPC1 2709/4885GAA 2328/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.