Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.94 |
| ▸ | LMNA | P02545 | 2/20 | 0.75 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.75 |
| ▸ | MEN1 | O00255 | 3/20 | 0.68 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.68 |
| ▸ | HTT | P42858 | 2/20 | 0.68 |
| ▸ | POLB | P06746 | 2/20 | 0.68 |
| ▸ | MAPT | P10636 | 1/20 | 0.68 |
| ▸ | HRH3 | Q9Y5N1 | 2/20 | 0.62 |
| ▸ | HPGD | P15428 | 1/20 | 0.58 |
| ▸ | PKM | P14618 | 1/20 | 0.57 |
| ▸ | TP53 | P04637 | 1/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15503835 | 0.98 | ALDH1A1 (0.97) | ALDH1A1LMNAKDM4EMEN1KMT2A | |
| SCHEMBL4874455 | 0.87 | ALDH1A1 (0.76) | ALDH1A1LMNAKDM4EMEN1KMT2A | |
| SCHEMBL4873274 | 0.86 | ALDH1A1 (0.71) | ALDH1A1LMNAKDM4EMEN1KMT2A | |
| Hydrochloric Acid SCHEMBL3844533 | 0.84 | ALDH1A1 (0.69) | ALDH1A1LMNAKDM4EMEN1KMT2A | |
| SCHEMBL14595456 | 0.84 | ALDH1A1 (0.69) | ALDH1A1LMNAKDM4EMEN1KMT2A | |
| SCHEMBL15033016 | 0.83 | ALDH1A1 (0.68) | ALDH1A1LMNAKDM4EMEN1KMT2A | |
| SCHEMBL12123619 | 0.83 | ALDH1A1 (0.97) | ALDH1A1LMNAMEN1KMT2AHTT | |
| SCHEMBL6500831 | 0.82 | ALDH1A1 (0.68) | ALDH1A1LMNAKDM4EMEN1KMT2A | |
| SCHEMBL6400029 | 0.81 | ALDH1A1 (0.65) | ALDH1A1LMNAKDM4EMEN1KMT2A | |
| SCHEMBL19190490 | 0.81 | ALDH1A1 (0.64) | ALDH1A1LMNAKDM4EMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2014133187-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND | FUJIFILM CORPORATION (JP) | 2014-09-04 | — | — | WO | disclosed |
| WO-2014119698-A1 | PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-08-07 | — | — | WO | disclosed |