SCHEMBL1593671

SCHEMBL1593671

C[S+](c1ccccc1)c1ccccc1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR3 P46089 2/20 0.34
HSD11B1 P28845 1/20 0.34
PTPN1 P18031 1/20 0.34
NR1H2 P55055 1/20 0.31
CA1 P00915 4/20 0.31
CA2 P00918 4/20 0.31
CA5A P35218 1/20 0.31
CA9 Q16790 1/20 0.31
NR1H3 Q13133 1/20 0.31
MMP1 P03956 1/20 0.30
MMP2 P08253 1/20 0.30
MMP9 P14780 1/20 0.30
MMP8 P22894 1/20 0.30
MMP13 P45452 1/20 0.30
ABCC9 O60706 1/20 0.30
ABCC8 Q09428 1/20 0.30
KCNJ11 Q14654 1/20 0.30
KCNJ8 Q15842 1/20 0.30
MEN1 O00255 1/20 0.30
CYP1A2 P05177 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL270029 0.95 CA1 (0.36) GPR3HSD11B1PTPN1CA1CA2
SCHEMBL1594209 0.90 GPR3 (0.34) GPR3HSD11B1PTPN1NR1H2CA1
SCHEMBL546606 0.86 GPR3 (0.36) GPR3HSD11B1PTPN1NR1H2CA1
SCHEMBL271196 0.85 CA1 (0.36) GPR3HSD11B1PTPN1CA1CA2
Trifluoromethanesulfonic Acid SCHEMBL36165 0.84 GPR3 (0.47) GPR3HSD11B1PTPN1CA1CA2
Trifluoromethanesulfonic Acid SCHEMBL2985951 0.83 GPR3 (0.41) GPR3HSD11B1PTPN1CA1CA2
SCHEMBL1593707 0.81 GPR3 (0.36) GPR3HSD11B1PTPN1CA1CA2
SCHEMBL51399 0.81 CA2 (0.38) GPR3PTPN1CA1CA2MMP1
SCHEMBL1482705 0.81 CA2 (0.38) GPR3PTPN1CA1CA2MMP1
Perflubutane SCHEMBL6325042 0.80 CA2 (0.39) GPR3PTPN1CA1CA2MMP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9176381-B2 Positive type photosensitive resin composition CHEIL INDUSTRIES INC. (KR) 2015-11-03 US disclosed
US-20110159428-A1 Positive Type Photosensitive Resin Composition CHEIL INDUSTRIES INC. (KR) 2011-06-30 US disclosed
US-20110091818-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed
US-20100279226-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-11-04 US disclosed
US-20100273113-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-10-28 US disclosed
US-20100273112-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-10-28 US disclosed