Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 17/20 | 0.38 |
| ▸ | CA1 | P00915 | 16/20 | 0.38 |
| ▸ | MMP1 | P03956 | 4/20 | 0.36 |
| ▸ | MMP2 | P08253 | 4/20 | 0.36 |
| ▸ | MMP9 | P14780 | 4/20 | 0.36 |
| ▸ | MMP8 | P22894 | 4/20 | 0.36 |
| ▸ | MMP13 | P45452 | 4/20 | 0.36 |
| ▸ | GPR3 | P46089 | 1/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1482705 | 1.00 | CA2 (0.38) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL546546 | 0.98 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL6117378 | 0.98 | CA2 (0.37) | CA2CA1MMP1MMP2MMP9 | |
| Perflubutane SCHEMBL6325042 | 0.98 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL60437 | 0.98 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL5567499 | 0.98 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL60137 | 0.98 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL4535202 | 0.98 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL3413696 | 0.97 | GPR3 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL7569683 | 0.95 | CA1 (0.35) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 5087 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-05-26 | — | — | US | claimed |
| EP-4735934-A2 | SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF | Gvd Corporation (US) | 2026-05-06 | — | — | EP | claimed |
| US-20260049180-A1 | FAST CURING, STICKY POLYMERS FOR MEDICAL USES | UNIV CALIFORNIA (US) | 2026-02-19 | — | — | US | claimed |
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| CN-119978604-A | Polymer film composition, polymer film, and laminate | 福斯特(滁州)新材料有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-113296359-B | Bottom layer composition and method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2025-05-02 | — | — | CN | claimed |
| CN-119923600-A | Chemically amplified positive resist composition for improving pattern profile and enhancing adhesion | YC化学制品株式会社 | 2025-05-02 | — | — | CN | claimed |
| US-12269925-B1 | Fast curing, biocompatible and biodegradable adhesives and sealants | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2025-04-08 | — | — | US | claimed |
| CN-119463075-A | Poly (4-hydroxystyrene) -based block copolymer and preparation and application thereof | 微芯新材料(湖州)有限公司 | 2025-02-18 | — | — | CN | claimed |
| US-12232338-B2 | Low-voltage operation dual-gate organic thin-film transistors and methods of manufacturing thereof | CORNING INCORPORATED (US) | 2025-02-18 | — | — | US | claimed |
| WO-2005036261-A1 | NEGATIVE RESIST COMPOSITION WITH FLUOROSULFONAMIDE-CONTAINING POLYMER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-04-21 | — | — | WO | claimed |
| US-6876017-B2 | Polymer sacrificial light absorbing structure and method | INTEL CORPORATION (US) | 2005-04-05 | — | — | US | claimed |
| US-20050058930-A1 | Negative resist composition with fluorosulfonamide-containing polymer | GLOBALFOUNDRIES U.S. INC. | 2005-03-17 | — | — | US | claimed |
| US-20040161710-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-08-19 | — | — | US | claimed |
| US-20040157415-A1 | Polymer sacrificial light absorbing structure and method | INTEL CORPORATION | 2004-08-12 | — | — | US | claimed |
| US-20040009433-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-01-15 | — | — | US | claimed |
| EP-1311908-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | CLARIANT INTERNATIONAL LTD. (CH) | 2003-05-21 | — | — | EP | claimed |
| US-6447980-B1 | POLY(MALEIC ANHYDRIDE-CO-T-BUTYL 5-NORBORNENE-2-CARBOXYLATE-CO-2-HYDROXYETHYL 5-NORBORNENE-2-CARBOXYLATE-CO-5-NORBORNENE-2-CARBOXYLIC ACID-CO-2-METHYL ADAMANTYL METHACRYLATE-CO-MEVALONIC LACTONE) AND ACID GENERATOR | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-09-10 | — | — | US | claimed |
| WO-2002006901-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | CLARIANT INTERNATIONAL LTD (CH) | 2002-01-24 | — | — | WO | claimed |
| US-6235446-B1 | MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | claimed |