SCHEMBL1593673

SCHEMBL1593673

O=S(=O)(OSC(c1ccccc1)c1ccccc1)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CA1 P00915 6/20 0.33
CA2 P00918 6/20 0.33
CYP1A2 P05177 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C9 P11712 1/20 0.32
TSHR P16473 1/20 0.32
SLC6A4 P31645 1/20 0.32
CYP2C19 P33261 1/20 0.32
SLC6A3 Q01959 1/20 0.32
MMP1 P03956 1/20 0.31
MMP2 P08253 1/20 0.31
MMP9 P14780 1/20 0.31
MMP8 P22894 1/20 0.31
MMP13 P45452 1/20 0.31
ALDH1A1 P00352 1/20 0.31
HSD11B1 P28845 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1593152 0.95 CA1 (0.37) CA1CA2CYP1A2CYP3A4CYP2D6
SCHEMBL1593376 0.85 MAPK1 (0.34) CA1CA2CYP1A2CYP3A4CYP2D6
SCHEMBL5916339 0.71 CA1 (0.39) CA1CA2MMP1MMP2MMP9
SCHEMBL9861793 0.71 SRC (0.42) CYP1A2CYP3A4CYP2D6CYP2C9TSHR
SCHEMBL965951 0.67 CA1 (0.39) CA1CA2CYP1A2CYP3A4CYP2D6
SCHEMBL5974094 0.66 KIF11 (0.37) CA1CA2MMP1MMP2MMP9
SCHEMBL6479936 0.66 CA2 (0.45) CA1CA2MMP1MMP2MMP9
SCHEMBL30096771 0.66 CA1 (0.39) CA1CA2SLC6A4SLC6A3MMP1
Iodide SCHEMBL5315919 0.65 PIK3CD (0.44) CA1CA2MMP1MMP2MMP9
SCHEMBL6900759 0.65 CA2 (0.46) CA1CA2MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110091818-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed
US-20100273113-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-10-28 US disclosed
US-20100273112-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-10-28 US disclosed