Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 5/20 | 0.39 |
| ▸ | CA2 | P00918 | 5/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.39 |
| ▸ | NR1H2 | P55055 | 6/20 | 0.38 |
| ▸ | NR1H3 | Q13133 | 6/20 | 0.36 |
| ▸ | HTR6 | P50406 | 1/20 | 0.35 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.35 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.34 |
| ▸ | ABCC9 | O60706 | 1/20 | 0.34 |
| ▸ | ABCC8 | Q09428 | 1/20 | 0.34 |
| ▸ | KCNJ11 | Q14654 | 1/20 | 0.34 |
| ▸ | KCNJ8 | Q15842 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL51400 | 0.95 | CA1 (0.43) | CA1CA2HSD11B1NR1H2NR1H3 | |
| SCHEMBL60438 | 0.93 | CA2 (0.44) | CA1CA2HSD11B1NR1H2NR1H3 | |
| SCHEMBL965542 | 0.93 | CA2 (0.44) | CA1CA2HSD11B1NR1H2NR1H3 | |
| SCHEMBL4535203 | 0.93 | CA2 (0.44) | CA1CA2HSD11B1NR1H2NR1H3 | |
| SCHEMBL60138 | 0.93 | CA2 (0.44) | CA1CA2HSD11B1NR1H2NR1H3 | |
| SCHEMBL2437767 | 0.93 | HTR6 (0.38) | CA1CA2HSD11B1NR1H2NR1H3 | |
| SCHEMBL217002 | 0.93 | HTR6 (0.38) | CA1CA2HSD11B1NR1H2NR1H3 | |
| SCHEMBL1593709 | 0.91 | HSD11B1 (0.40) | CA1CA2HSD11B1NR1H2ABCC9 | |
| SCHEMBL5460846 | 0.91 | HSD11B1 (0.43) | CA1CA2HSD11B1NR1H2NR1H3 | |
| SCHEMBL962839 | 0.89 | HSD11B1 (0.41) | CA1CA2HSD11B1NR1H2NR1H3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9176381-B2 | Positive type photosensitive resin composition | CHEIL INDUSTRIES INC. (KR) | 2015-11-03 | — | — | US | disclosed |
| EP-2244124-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-26 | — | — | EP | disclosed |
| EP-2244126-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2000851-B1 | Photomask blank, resist pattern forming process, and photomask preparation process | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-1582926-B1 | Positive resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2015-04-01 | — | — | EP | disclosed |
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| EP-2267533-B1 | Resist composition | SHINETSU CHEMICAL CO (JP) | 2014-10-22 | — | — | EP | disclosed |
| EP-2244125-B1 | Resist composition | SHINETSU CHEMICAL CO (JP) | 2014-10-08 | — | — | EP | disclosed |
| US-8771921-B2 | Negative resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-08 | — | — | US | disclosed |
| EP-2146245-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-06-25 | — | — | EP | disclosed |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| US-7261994-B2 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-28 | — | — | US | disclosed |
| US-20070190448-A1 | Positive-type resist composition for liquid immersion lithography and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| EP-1736827-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-12-27 | — | — | EP | disclosed |
| US-20050227170-A1 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-10-13 | — | — | US | disclosed |
| EP-1582926-A2 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-10-05 | — | — | EP | disclosed |
| EP-0611998-B1 | Positive-working radiation-sensitive mixture | CLARIANT FINANCE BVI LTD (VG) | 2000-08-02 | — | — | EP | disclosed |
| US-5843319-A | Positive-working radiation-sensitive mixture | HOECHST JAPAN LIMITED (JP) | 1998-12-01 | — | — | US | disclosed |
| US-5525453-A | MIXTURE OF POLYMERIC BINDER, COMPOUND HAVING ATLEAST ONE CLEAVABLE WITH AN ACID, A COMPOUND CAPABLE OF PRODUCING AN ACID UPON RADIATION, A BASIC AMMONIUM AND A BASIC SULFONIUM COMPOUND | HOECHST JAPAN LIMITED (JP) | 1996-06-11 | — | — | US | disclosed |
| EP-0611998-A2 | Positive-working radiation-sensitive mixture | HOECHST JAPAN LIMITED (JP) | 1994-08-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | HCN3, ASIC3, TST | CA1 557/4885CA2 29/4885HSD11B1 2970/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.