SCHEMBL15945482

SCHEMBL15945482

CCC(C)(C)C(=O)OCOc1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.41
NPSR1 Q6W5P4 2/20 0.41
ELANE P08246 3/20 0.39
SMN1; SMN2 Q16637 4/20 0.39
PKM P14618 2/20 0.39
ALDH1A1 P00352 3/20 0.38
CA12 O43570 7/20 0.37
CA1 P00915 7/20 0.37
CA2 P00918 7/20 0.37
CA9 Q16790 7/20 0.37
CA7 P43166 3/20 0.37
KMT2A Q03164 1/20 0.36
TSHR P16473 2/20 0.36
POLB P06746 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2740700 0.86 CA12 (0.43) GAANPSR1SMN1; SMN2CA12CA1
SCHEMBL2740677 0.82 ELANE (0.54) ELANESMN1; SMN2PKMALDH1A1POLB
SCHEMBL18961212 0.80 PPARA (0.44) PKMKMT2APOLB
SCHEMBL17770838 0.74 L3MBTL1 (0.44) SMN1; SMN2ALDH1A1KMT2A
SCHEMBL15179973 0.74 THRB (0.50) SMN1; SMN2ALDH1A1KMT2APOLB
SCHEMBL16727305 0.74 FKBP1A (0.41) SMN1; SMN2CA12CA1CA2CA9
SCHEMBL10053092 0.73 ELANE (0.44) GAAELANESMN1; SMN2ALDH1A1CA2
SCHEMBL755720 0.72 CA12 (0.66) GAANPSR1SMN1; SMN2PKMALDH1A1
SCHEMBL15912576 0.72 CA12 (0.48) GAACA12CA1CA2CA9
SCHEMBL13683046 0.71 CHRM2 (0.41) ELANESMN1; SMN2ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9323150-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern FUJIFILM CORPORATION (JP) 2016-04-26 US disclosed
US-20140227636-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2014-08-14 US disclosed