SCHEMBL13683046

SCHEMBL13683046

CCC(C)(C)C(=O)OCCOCOc1ccc(O)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 3/20 0.41
LTA4H P09960 4/20 0.41
NR5A1 Q13285 1/20 0.41
BCHE P06276 1/20 0.39
ALDH1A1 P00352 1/20 0.39
ESR1 P03372 2/20 0.39
ELANE P08246 1/20 0.38
LMNA P02545 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2D6 P10635 1/20 0.38
TSHR P16473 1/20 0.38
MAPK1 P28482 1/20 0.38
CYP2C19 P33261 1/20 0.38
NR1H2 P55055 1/20 0.38
RNASEL Q05823 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
CHRM4 P08173 1/20 0.38
CHRM1 P11229 1/20 0.38
CHRM3 P20309 1/20 0.38
ABCG2 Q9UNQ0 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29324089 0.90 LTA4H (0.47) CHRM2LTA4HNR5A1BCHEESR1
SCHEMBL13683037 0.89 MEN1 (0.47) ALDH1A1LMNACYP1A2TSHRSMN1; SMN2
SCHEMBL13683041 0.87 TDP1 (0.44) CHRM2TSHRSMN1; SMN2CHRM4CHRM1
SCHEMBL13683043 0.87 CHRNB2 (0.43) ALDH1A1TSHRMAPK1
SCHEMBL13683051 0.86 ELANE (0.40) BCHEALDH1A1ESR1ELANELMNA
SCHEMBL13683058 0.85 NPC1 (0.46) LMNASMN1; SMN2
SCHEMBL13683066 0.83 PPARG (0.47) ALDH1A1MAPK1SMN1; SMN2
SCHEMBL13683039 0.80 L3MBTL1 (0.50) LMNAMAPK1SMN1; SMN2
SCHEMBL13683042 0.80 GAA (0.41) CHRM2ALDH1A1LMNASMN1; SMN2CHRM4
SCHEMBL2742155 0.79 NPC1 (0.49) CHRM2ALDH1A1ESR1LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed