SCHEMBL15959536

SCHEMBL15959536

COCc1cc(C(CCc2cc(CCO)c(O)c(CCO)c2)(CCc2cc(COC)c(O)c(COC)c2)c2cc(CCO)c(O)c(COC)c2)cc(CCO)c1O

nearest known ligand 0.35

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
PRKCE Q02156 3/20 0.35
MYLK Q15746 2/20 0.35
MEN1 O00255 1/20 0.35
ALDH1A1 P00352 1/20 0.35
PRKCG P05129 1/20 0.35
MAPT P10636 1/20 0.35
PRKCA P17252 1/20 0.35
APEX1 P27695 1/20 0.35
RECQL P46063 1/20 0.35
KMT2A Q03164 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TNKS2 Q9H2K2 1/20 0.32
ESR1 P03372 2/20 0.31
ESR2 Q92731 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10455314 0.93 PRKCE (0.40) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL10452200 0.87 ESR1 (0.40) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL19600596 0.81 PRKCE (0.43) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL16850503 0.81 PRKCE (0.46) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL10051862 0.80 ALOX15 (0.46) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL10114799 0.80 PRKCE (0.40) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL16850512 0.80 ALOX15 (0.46) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL10114795 0.80 CYP2C19 (0.46) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL18184901 0.80 PRKCE (0.40) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL18184902 0.80 ALOX15 (0.46) PRKCEMYLKMEN1ALDH1A1PRKCG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9541827-B2 Photosensitive composition, cured film and production process thereof, and electronic part JSR CORPORATION (JP) 2017-01-10 US disclosed
US-20140234777-A1 PHOTOSENSITIVE COMPOSITION, CURED FILM AND PRODUCTION PROCESS THEREOF, AND ELECTRONIC PART JSR CORPORATION (JP) 2014-08-21 US disclosed