SCHEMBL19600596

SCHEMBL19600596

COCc1cc(CCO)c(O)c(COC)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRKCE Q02156 3/20 0.43
MYLK Q15746 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
ALDH1A1 P00352 2/20 0.43
MAPT P10636 2/20 0.43
MEN1 O00255 1/20 0.43
PRKCG P05129 1/20 0.43
PRKCA P17252 1/20 0.43
APEX1 P27695 1/20 0.43
RECQL P46063 1/20 0.43
KMT2A Q03164 1/20 0.43
SHBG P04278 1/20 0.35
TNKS2 Q9H2K2 1/20 0.35
ALOX5 P09917 5/20 0.33
CA2 P00918 1/20 0.33
PTGS2 P35354 3/20 0.33
POLB P06746 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
ERN1 O75460 1/20 0.31
HSD17B3 P37058 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15686504 0.91 SHBG (0.46) PRKCEMYLKTDP1ALDH1A1MAPT
SCHEMBL16207219 0.91 SHBG (0.46) PRKCEMYLKTDP1ALDH1A1MAPT
SCHEMBL19600585 0.89 SHBG (0.49) PRKCEMYLKTDP1ALDH1A1MAPT
SCHEMBL19600598 0.89 PRKCE (0.41) PRKCEMYLKTDP1ALDH1A1MAPT
SCHEMBL19600594 0.89 TDP1 (0.37) PRKCEMYLKTDP1ALDH1A1MAPT
SCHEMBL16850503 0.89 PRKCE (0.46) PRKCEMYLKTDP1ALDH1A1MAPT
SCHEMBL14949891 0.88 PRKCE (0.52) PRKCEMYLKTDP1ALDH1A1MAPT
SCHEMBL10114775 0.87 PRKCE (0.44) PRKCEMYLKTDP1ALDH1A1MAPT
SCHEMBL24800081 0.85 PRKCE (0.43) PRKCEMYLKTDP1ALDH1A1MAPT
SCHEMBL10114746 0.85 PRKCE (0.43) PRKCEMYLKTDP1ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350305-A1 MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND TREATMENT LIQUID FUJIFILM CORPORATION (JP) 2023-11-02 US disclosed
US-20170327644-A1 RESIN AND PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES, INC. (JP) 2017-11-16 US disclosed