SCHEMBL15959538

SCHEMBL15959538

CC(C)(c1ccc(OCCC2=NCCO2)cc1)c1ccc(OCCC2=NCCO2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PSMB1 P20618 1/20 0.43
▸ PSMB5 P28074 1/20 0.43
▸ PSMB2 P49721 1/20 0.43
▸ MEN1 O00255 4/20 0.43
▸ KMT2A Q03164 4/20 0.43
▸ ALDH1A1 P00352 3/20 0.43
▸ TP53 P04637 2/20 0.43
▸ MAPT P10636 2/20 0.43
▸ HPGD P15428 2/20 0.43
▸ TSHR P16473 2/20 0.43
▸ HIF1A Q16665 2/20 0.43
▸ CYP1A2 P05177 1/20 0.43
▸ PPARG P37231 1/20 0.43
▸ SMN1; SMN2 Q16637 1/20 0.42
▸ KDM4E B2RXH2 4/20 0.40
▸ POLB P06746 1/20 0.40
▸ KCNH2 Q12809 1/20 0.37
▸ HRH3 Q9Y5N1 1/20 0.37
▸ HTT P42858 2/20 0.37
▸ LTA4H P09960 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12085939 0.72 — —
SCHEMBL6664687 0.71 HDAC3 (0.43) KCNH2HRH3LTA4HHDAC3HDAC4
SCHEMBL9003784 0.70 HDAC3 (0.60) KCNH2HRH3LTA4HHDAC3HDAC4
SCHEMBL11709160 0.70 — —
SCHEMBL8040746 0.69 — —
SCHEMBL3267040 0.69 SMN1; SMN2 (0.56) PSMB1PSMB5PSMB2MEN1KMT2A
SCHEMBL9492663 0.69 SMN1; SMN2 (0.61) PSMB1PSMB5PSMB2MEN1KMT2A
SCHEMBL13006945 0.68 SMN1; SMN2 (0.51) PSMB1PSMB5PSMB2MEN1KMT2A
SCHEMBL9649082 0.68 LTA4H (0.52) MEN1KMT2AALDH1A1TP53MAPT
SCHEMBL11783308 0.67 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9541827-B2 Photosensitive composition, cured film and production process thereof, and electronic part JSR CORPORATION (JP) 2017-01-10 — — US disclosed
US-9541827-B2 Photosensitive composition, cured film and production process thereof, and electronic part JSR CORPORATION (JP) 2017-01-10 — — US disclosed
US-20140234777-A1 PHOTOSENSITIVE COMPOSITION, CURED FILM AND PRODUCTION PROCESS THEREOF, AND ELECTRONIC PART JSR CORPORATION (JP) 2014-08-21 — — US disclosed
US-20140234777-A1 PHOTOSENSITIVE COMPOSITION, CURED FILM AND PRODUCTION PROCESS THEREOF, AND ELECTRONIC PART JSR CORPORATION (JP) 2014-08-21 — — US disclosed
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