SCHEMBL15964854

SCHEMBL15964854

O=C(/C=C/c1ccc(CO)cc1O)N1CCCCC1

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ PELI1 Q96FA3 3/20 0.52
▸ ALDH1A1 P00352 7/20 0.49
▸ RAB9A P51151 5/20 0.49
▸ NPC1 O15118 4/20 0.49
▸ SMN1; SMN2 Q16637 3/20 0.49
▸ MEN1 O00255 3/20 0.49
▸ KMT2A Q03164 3/20 0.49
▸ L3MBTL1 Q9Y468 2/20 0.49
▸ POLB P06746 2/20 0.49
▸ TRPV1 Q8NER1 3/20 0.47
▸ ALOX5 P09917 2/20 0.47
▸ MAOB P27338 1/20 0.47
▸ HPGD P15428 2/20 0.45
▸ MAPT P10636 3/20 0.44
▸ KDM4E B2RXH2 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10322050 0.83 PELI1 (0.67) PELI1ALDH1A1NPC1MEN1KMT2A
SCHEMBL766060 0.83 PELI1 (0.67) PELI1ALDH1A1NPC1MEN1KMT2A
SCHEMBL10446033 0.81 PELI1 (0.63) PELI1ALDH1A1RAB9ANPC1SMN1; SMN2
SCHEMBL766014 0.81 MAPT (0.55) PELI1ALDH1A1RAB9ANPC1SMN1; SMN2
SCHEMBL10445937 0.80 PELI1 (0.63) PELI1ALDH1A1RAB9ANPC1SMN1; SMN2
SCHEMBL10446290 0.79 PELI1 (0.62) PELI1ALDH1A1RAB9ANPC1SMN1; SMN2
SCHEMBL13087237 0.78 PELI1 (0.60) PELI1ALDH1A1RAB9ANPC1SMN1; SMN2
SCHEMBL10230139 0.77 TRPV1 (0.58) PELI1ALDH1A1SMN1; SMN2MEN1KMT2A
SCHEMBL29449824 0.77 TRPV1 (0.58) PELI1ALDH1A1SMN1; SMN2MEN1KMT2A
SCHEMBL15453263 0.77 ALDH1A1 (0.63) PELI1ALDH1A1RAB9ANPC1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9891527-B2 Developing solution and development processing method of photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 2018-02-13 — — US disclosed
US-20140234784-A1 DEVELOPING SOLUTION AND DEVELOPMENT PROCESSING METHOD OF PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2014-08-21 — — US disclosed
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