Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PELI1 | Q96FA3 | 3/20 | 0.67 |
| ▸ | CHRNA7 | P36544 | 6/20 | 0.53 |
| ▸ | TYR | P14679 | 2/20 | 0.53 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.51 |
| ▸ | MAOB | P27338 | 1/20 | 0.51 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | NPC1 | O15118 | 1/20 | 0.50 |
| ▸ | GAA | P10253 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.49 |
| ▸ | BACE1 | P56817 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10322050 | 1.00 | PELI1 (0.67) | PELI1CHRNA7TYRALOX5MAOB | |
| SCHEMBL10446033 | 0.85 | PELI1 (0.63) | PELI1ALOX5MAOBTRPV1MEN1 | |
| SCHEMBL766014 | 0.85 | MAPT (0.55) | PELI1ALOX5MAOBTRPV1MEN1 | |
| SCHEMBL29449824 | 0.85 | TRPV1 (0.58) | PELI1TYRTRPV1MEN1GAA | |
| SCHEMBL10230139 | 0.85 | TRPV1 (0.58) | PELI1TYRTRPV1MEN1GAA | |
| SCHEMBL10446290 | 0.84 | PELI1 (0.62) | PELI1ALOX5MAOBTRPV1MEN1 | |
| SCHEMBL15964854 | 0.83 | PELI1 (0.52) | PELI1ALOX5MAOBTRPV1MEN1 | |
| SCHEMBL31505211 | 0.83 | CHRNA7 (0.58) | PELI1CHRNA7TYRBACE1 | |
| SCHEMBL13087237 | 0.83 | PELI1 (0.60) | PELI1ALOX5MAOBTRPV1MEN1 | |
| SCHEMBL20109836 | 0.83 | PELI1 (0.55) | PELI1ALOX5MAOBTRPV1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8778596-B2 | Photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8778596-B2 | Photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20130309607-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-11-21 | — | — | US | disclosed |
| US-8476444-B2 | Base generator | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-8476444-B2 | Base generator | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-20120183751-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| CN-102575140-A | Base-generating agent, photosensitive resin composition, material for pattern-forming comprising said photosensitive resin composition, pattern-forming method using said photosensitive resin composition, and article | DAINIPPON PRINTING CO LTD | 2012-07-11 | — | — | CN | disclosed |
| US-20120070781-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20120070781-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20110086311-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-04-14 | — | — | US | disclosed |
| US-20110086311-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-04-14 | — | — | US | disclosed |
| WO-2010113813-A1 | BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION | 大日本印刷株式会社 (JP) | 2010-10-07 | — | — | WO | disclosed |
| WO-2009123122-A1 | BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN-FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION, AND ARTICLE | 大日本印刷株式会社 (JP) | 2009-10-08 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120070781-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME | RER1, SUN2, REV1 | PELI1 585/4885CHRNA7 2998/4885TYR 507/4885 |
| US-20110086311-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION | RER1, SUN2, LCP1 | PELI1 586/4885CHRNA7 3459/4885TYR 609/4885 |
| US-20120183751-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME | RER1, SUN2, POLR1G | PELI1 899/4885CHRNA7 2799/4885TYR 515/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.