SCHEMBL15965768

SCHEMBL15965768

CCC(C)C(=O)Oc1ccc(-c2ccc(C)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.47
PPARG P37231 1/20 0.42
PPARA Q07869 1/20 0.42
MAPT P10636 1/20 0.42
ELANE P08246 2/20 0.42
KMT2A Q03164 4/20 0.42
MEN1 O00255 2/20 0.42
POLB P06746 1/20 0.41
APEX1 P27695 1/20 0.41
ATM Q13315 1/20 0.41
GAA P10253 1/20 0.41
ALDH1A1 P00352 2/20 0.39
ESR1 P03372 1/20 0.39
HIF1A Q16665 1/20 0.39
NPSR1 Q6W5P4 1/20 0.38
HDAC3 O15379 1/20 0.38
HDAC4 P56524 1/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC7 Q8WUI4 1/20 0.38
HDAC2 Q92769 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12419169 0.95 LMNA (0.52) LMNAELANEKMT2AMEN1POLB
SCHEMBL10000787 0.93 ELANE (0.47) MAPTELANEKMT2AMEN1GAA
SCHEMBL14169489 0.88 MAPT (0.46) PPARGPPARAMAPTELANEGAA
SCHEMBL9488299 0.87 ESR2 (0.44) LMNAMAPTELANEALDH1A1ESR1
SCHEMBL825538 0.87 MAPT (0.56) MAPTELANEKMT2AMEN1GAA
SCHEMBL10422503 0.87 HSD17B10 (0.53) LMNAMAPTELANEKMT2AMEN1
SCHEMBL17131758 0.86 ELANE (0.45) LMNAPPARAMAPTELANEKMT2A
SCHEMBL10422526 0.85 ESR1 (0.57) LMNAMAPTELANEKMT2AMEN1
SCHEMBL14781032 0.85 MAPT (0.48) LMNAMAPTELANEKMT2AMEN1
SCHEMBL20614960 0.84 MAPT (0.54) MAPTELANEKMT2AMEN1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9417528-B2 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2016-08-16 US disclosed
US-20150248056-A1 PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-03 US disclosed
US-9075310-B2 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2015-07-07 US disclosed
US-20140234761-A1 PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-21 US disclosed