SCHEMBL15965769

SCHEMBL15965769

CCC(C)C(=O)OCc1ccc(Cl)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 3/20 0.48
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
CA9 Q16790 1/20 0.48
PPARG P37231 2/20 0.46
PPARA Q07869 2/20 0.46
NPSR1 Q6W5P4 2/20 0.46
MEN1 O00255 1/20 0.46
MAPT P10636 1/20 0.46
KMT2A Q03164 1/20 0.46
L3MBTL1 Q9Y468 3/20 0.45
MAPK1 P28482 1/20 0.45
CYP3A4 P08684 3/20 0.44
CYP1A2 P05177 2/20 0.44
CYP2C9 P11712 2/20 0.44
CYP2C19 P33261 2/20 0.44
CYP2D6 P10635 1/20 0.44
NFKB1 P19838 1/20 0.44
MAOA P21397 1/20 0.44
MAOB P27338 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2742150 0.86 MEN1 (0.52) CA1CA2CA9MEN1KMT2A
SCHEMBL12116549 0.84 ALDH1A1 (0.45) MMP2CA1CA2CA9MAPT
SCHEMBL9976423 0.84 MMP2 (0.51) MMP2CA1CA2CA9PPARG
SCHEMBL24164305 0.83 LMNA (0.43) CA1CA2MEN1MAPTKMT2A
SCHEMBL13380665 0.83 KDM4E (0.48) MEN1MAPTKMT2AL3MBTL1MAOB
SCHEMBL12026774 0.83 CA1 (0.40) CA1CA2PPARGPPARAMEN1
SCHEMBL12677513 0.83 TPSAB1 (0.50) CA1CA2MEN1KMT2AMAOB
SCHEMBL873471 0.82 ALDH1A1 (0.58) KMT2AL3MBTL1MAPK1CYP3A4HPGD
SCHEMBL8954882 0.82 ALDH1A1 (0.58) KMT2AL3MBTL1MAPK1CYP3A4HPGD
SCHEMBL12191612 0.82 ALDH1A1 (0.58) KMT2AL3MBTL1MAPK1CYP3A4HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9075310-B2 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2015-07-07 US disclosed
US-20140234761-A1 PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-21 US disclosed