Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAPGEF4 | Q8WZA2 | 2/20 | 0.43 |
| ▸ | PGK1 | P00558 | 1/20 | 0.38 |
| ▸ | PGK2 | P07205 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | IDO1 | P14902 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.35 |
| ▸ | CES2 | O00748 | 1/20 | 0.34 |
| ▸ | IDH1 | O75874 | 1/20 | 0.34 |
| ▸ | XPO1 | O14980 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | CASP3 | P42574 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.33 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.33 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12447064 | 0.91 | IDO1 (0.40) | RAPGEF4ALDH1A1IDO1MAPTCES2 | |
| SCHEMBL4363284 | 0.89 | SMN1; SMN2 (0.38) | PGK1PGK2ALDH1A1MAPTNPC1 | |
| SCHEMBL2228151 | 0.84 | NPC1 (0.41) | ALDH1A1MAPTNPC1LMNAMAPK1 | |
| SCHEMBL22909965 | 0.83 | ALDH1A1 (0.36) | RAPGEF4ALDH1A1IDO1MAPTCES2 | |
| SCHEMBL107119 | 0.82 | RAPGEF4 (0.56) | RAPGEF4PGK1PGK2IDO1MAPT | |
| SCHEMBL14618001 | 0.82 | MAPT (0.42) | ALDH1A1IDO1MAPTCES2NPC1 | |
| SCHEMBL22783308 | 0.81 | RAPGEF4 (0.44) | RAPGEF4PGK1PGK2ALDH1A1IDO1 | |
| Ethylamine SCHEMBL5221090 | 0.80 | RAPGEF4 (0.47) | RAPGEF4PGK1PGK2IDO1MAPT | |
| SCHEMBL19354870 | 0.79 | NPC1 (0.33) | RAPGEF4PGK1PGK2MAPTNPC1 | |
| SCHEMBL780091 | 0.79 | NPC1 (0.43) | ALDH1A1MAPTNPC1LMNAMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9816003-B2 | Method of producing structure containing phase-separated structure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-11-14 | — | — | US | disclosed |
| US-9644110-B2 | Method of producing structure containing phase-separated structure and method of forming top coat film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-05-09 | — | — | US | disclosed |
| US-9567477-B2 | Undercoat agent and method of producing structure containing phase-separated structure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-02-14 | — | — | US | disclosed |
| US-9442371-B2 | Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-13 | — | — | US | disclosed |
| US-9312127-B2 | Method for producing semiconductor apparatus substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20160064220-A1 | METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-03-03 | — | — | US | disclosed |
| US-9206307-B2 | Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-12-08 | — | — | US | disclosed |
| US-9169421-B2 | Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-27 | — | — | US | disclosed |
| US-20150291832-A1 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE AND METHOD OF FORMING TOP COAT FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-15 | — | — | US | disclosed |
| US-20150205207-A1 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN AND METHOD OF FORMING FINE PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-23 | — | — | US | disclosed |
| US-20150118397-A1 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-30 | — | — | US | disclosed |
| US-20150034593-A1 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN AND METHOD OF FORMING FINE PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |
| US-20150030773-A1 | UNDERCOAT AGENT AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-01-29 | — | — | US | disclosed |
| US-20140238954-A1 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN, AND TOP COAT MATERIAL | TOKYO INSTITUTE OF TECHNOLOGY (JP) | 2014-08-28 | — | — | US | disclosed |