SCHEMBL16000784

SCHEMBL16000784

O=C(NC(=O)C12CC3CC(CC(C3)C1)C2)C(F)(F)F

nearest known ligand 0.51

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.51
LMNA P02545 2/20 0.51
NPSR1 Q6W5P4 2/20 0.51
EPHX1 P07099 1/20 0.49
HTT P42858 4/20 0.49
POLB P06746 2/20 0.46
GAA P10253 1/20 0.46
CNR2 P34972 1/20 0.46
P2RX7 Q99572 4/20 0.45
CRHBP P24387 1/20 0.44
CRHR2 Q13324 1/20 0.44
MCOLN3 Q8TDD5 1/20 0.44
GLA P06280 1/20 0.44
P2RX4 Q99571 2/20 0.44
KDM4E B2RXH2 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27444946 0.85 ALDH1A1 (0.58) ALDH1A1LMNANPSR1EPHX1HTT
SCHEMBL24028378 0.81 ALDH1A1 (0.45) ALDH1A1LMNANPSR1EPHX1HTT
SCHEMBL25765152 0.81 ALDH1A1 (0.57) ALDH1A1LMNANPSR1HTTPOLB
SCHEMBL27446711 0.77 ALDH1A1 (0.42) ALDH1A1LMNANPSR1EPHX1HTT
SCHEMBL24028734 0.76 ALDH1A1 (0.41) ALDH1A1LMNANPSR1EPHX1HTT
SCHEMBL14925599 0.75 ALDH1A1 (0.53) ALDH1A1LMNANPSR1HTTPOLB
SCHEMBL27445070 0.75 ALDH1A1 (0.43) ALDH1A1LMNANPSR1EPHX1HTT
SCHEMBL24028213 0.74 ALDH1A1 (0.40) ALDH1A1LMNANPSR1EPHX1HTT
SCHEMBL27445698 0.74 ALDH1A1 (0.43) ALDH1A1LMNANPSR1EPHX1HTT
SCHEMBL7353899 0.72 EPHX2 (0.59) ALDH1A1LMNANPSR1EPHX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9523912-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound FUJIFILM CORPORATION (JP) 2016-12-20 US disclosed
US-9523912-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound FUJIFILM CORPORATION (JP) 2016-12-20 US disclosed
US-20160070167-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND FUJIFILM CORPORATION (JP) 2016-03-10 US disclosed
US-20160070167-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND FUJIFILM CORPORATION (JP) 2016-03-10 US disclosed
WO-2014133187-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND FUJIFILM CORPORATION (JP) 2014-09-04 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160070167-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND RER1, TERB1, RXRA ALDH1A1 2066/4885LMNA 2745/4885NPSR1 2716/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.